Fischione Plasma Cleaner Demonstration

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Fischione Plasma CleanerDemonstration

• 8/20/02 by Dr. Rocco Cerchiara

Chris Deeb Leah Lucas 9/9/02
Model 1020
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Materials for demonstration

• Cu2O layer on Si (001)
• TiNi

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Cu2O Si interface
Pre-clean
Post-clean

• Plasma clean removed induced carbon contamination

Images courtesy of L. Lucas
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Cu2O Si interface
Pre-clean2
Post-clean2

• Plasma clean retarded additional surface
  contamination

Images courtesy of L. Lucas
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Cu2O Si interface

• STEM image
• Plasma clean does not remove copper contamination

Images courtesy of L. Lucas
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TiNi/Si Reaction Layers
Pre-clean
Post-clean

• Plasma clean removes light C contamination

Images courtesy of C. Deeb
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TiNi/Si Reaction Layers
Pre-clean
Post-clean

• Removes C contamination from long exposure to
  strong beam

Images courtesy of C. Deeb
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TiNi/Si Reaction Layers
Post-clean
Pre-clean

• Removes contamination form long exposure to STEM
  Probe

Images courtesy of C. Deeb