ITRSORTC Tables Technology Node, DRAM Chip Size, Logic Chip Size, and key TWG Lineitems 1999 refers - PowerPoint PPT Presentation

1 / 44
About This Presentation
Title:

ITRSORTC Tables Technology Node, DRAM Chip Size, Logic Chip Size, and key TWG Lineitems 1999 refers

Description:

Technology Node, DRAM Chip Size, Logic Chip Size, and key TWG Line-items ('1999 ' refers to 1999 ITRS; 'Sc. ... Alan Allan 480-554-8624, alan.k.allan_at_intel.com ... – PowerPoint PPT presentation

Number of Views:88
Avg rating:3.0/5.0
Slides: 45
Provided by: alanken
Category:

less

Transcript and Presenter's Notes

Title: ITRSORTC Tables Technology Node, DRAM Chip Size, Logic Chip Size, and key TWG Lineitems 1999 refers


1
ITRS/ORTC TablesTechnology Node, DRAM Chip
Size, Logic Chip Size, and key TWG Line-items
(1999 refers to 1999 ITRS Sc. 2.0 refers
to the IRC Most Aggressive Scenario 2.0
Proposal, 7/11/00)ITRS 2000 Update Review -
Taipei 12/6/00Rev 1kg_h, 11/7/00 Contact
Alan Allan 480-554-8624, alan.k.allan_at_intel.com
2
(No Transcript)
3
(No Transcript)
4
(No Transcript)
5
Summary of Key Assumption Proposed Changes
1999 ITRS vs. Sc.2.0 Proposal (Technology Node)
  • Technology Node Assumptions (per IRC Proposal
    7/11/00)
  • a) DRAM Half-Pitch
  • 1999 3-year Node cycle (0.7x/3yrs), except
    year 2005 shifted off trend
  • Sc.2.0 130nm pull-in to 2001 and
    .7x/3yrs(.5x/6yrs) reduction rate
  • 1999 (nm) 1999/180, 2000/165, 2001/150,
    2002/130, 2003/120, 2004/110, 2005/100
    2008/70, 2011/50, 2014/35
  • Sc.2.0 (nm) 1999/180, 2000/150, 2001/130,
    2002/115, 2003/100, 2004/90, 2005/80 2008/60,
    2011/40, 2014/30
  • Note .7x/Node(.5x/2 Nodes) 2001/130 04/90
    07/65 10/45 13/33 16/23
  • b) MPU/ASIC Half-Pitch
  • 1999 MPU/ASIC Half-Pitch Same, lagged
    typically 1-2 years behind DRAM
  • Sc.2.0 tied to DRAM pull-in one year starting
    160nm in 2001, then .7x/3yrs(.5x/6yrs)
    reduction rate
  • 1999 (nm) 1999/230, 2000/210, 2001/180,
    2002/160, 2003/145, 2004/130, 2005/115
    2008/80, 2011/55, 2014/40
  • Sc.2.0 (nm) 1999/230, 2000/190, 2001/160,
    2002/145, 2003/130, 2004/115, 2005/100
    2008/70, 2011/50, 2014/35

6
Summary of Key Assumption Proposed Changes
1999 ITRS vs. Sc.2.0 Proposal (Technology Node)
  • Technology Node Assumptions (cont.)
  • c) MPU/ASIC In Resist Gate Length
  • 1999 MPU Gate Length 2-year node cycle
    (.7x/2yrs) to 2001, then 3-year node cycle
    (.7x/3yrs) ASIC Gate Length typically lagged 1
    node behind MPU
  • Sc.2.0 1. MPU Same as 1999 ITRS, except
    Variable ranges in 2002, 2011, 2014 replaced
    by single targets 2. ASIC same as MPU
  • 1999 (nm) MPU 1999/140 , 2000/120,
    2001/100, 2002/85-90, 2003/80, 2004/70, 2005/65
    2008/45, 2011/30-32,
    2014/20-22
  • ASIC 1999/180 , 2000/165,
    2001/150, 2002/130, 2003/120, 2004/110, 2005/100
    2008/70, 2011/50, 2014/35
  • Sc.2.0 (nm) MPU/ASIC 1999/140 , 2000/120,
    2001/100, 2002/90, 2003/80, 2004/70,
    2005/65 2008/45, 2011/33, 2014/23
  • d) NEW (Sc.2.0) (nm) MPU/ASIC Physical Bottom
    Gate Length line item targets added which are
    pulled-in 1 year from the Lithography In Resist
    targets.
  • NEW (Sc.2.0) (nm) 1999/120, 2000/100, 2001/90,
    2002/80, 2003/70, 2004/65, 2005/60
    2008/40, 2011/30, 2014/20
  • e) Litho TWG Proposal Full 70 Reduction of
    Printed Gate Length from Sc.2.0, plus 1-year
    lead for Physical Bottom Gate Length

7
(No Transcript)
8
(No Transcript)
9
Summary of Key Assumption Proposed Changes
1999 ITRS vs. Sc.2.0 Proposal (cont.- DRAM)
  • DRAM Assumptions
  • a) Cell Area Factor Limits (from FEP TWG)
  • 1999 8x/1999 -gt 6x/2002 -gt 4.4x/2005 -gt
    3.0x/2011 -gt 2.5x/2014
  • Sc.2.0 8x/1999-2004, 6x/2005-2010,
    4x/2011-16
  • b) Cell Array Efficiency Limit Trends (from FEP,
    Nikkei Microdevices)
  • 1999 Intro 1999/70 --gt 2016/75
  • Sc.2.0 Intro 1999/70 --gt 2016/75
  • 1999 Production 1999/53 --gt 2016/57
  • Sc.2.0 Production 1999/53 --gt 2016/58
  • c) Litho Field Size (from Litho TWG)
  • 1999 4x Magnification, 6-inch Reticle
  • Intro 1999-2016 25x32 800mm2
  • Production 1999-2016 12.5x32 400mm (2
    chips/field)
  • Sc.2.0 5x Magnification, 6-inch Reticle
  • Intro 2004-2016 22x26 572mm2
  • Production 2004-2016 11x26 286mm2 (2
    chips/field)
  • d) Bits/Chip Product Generation Growth Rate
  • 1999 1999-2014 2x bits/chip every 2 years
  • Sc.2.0 _at_ Introduction Through 8Gbit 2x
    bits/chip every 2 years

10
Summary of Key Assumption Proposed Changes
1999 ITRS vs. Sc.2.0 Proposal (cont.- Logic)
  • MPU Assumptions
  • a) High Performance (HP) MPU _at_Ramp Starting Chip
    Size
  • WAS 2Mbyte on-chip (6t) SRAM in 1999
  • (170mm2 Core plus 280mm2 SRAM 450mm2/1999)
  • IS 1Mbyte on-chip (6t) SRAM in 1999
  • (170mm2 Core plus 140mm2 SRAM 310mm2/1999)
  • b) Cost Performance (CP) Starting Chip Size
    (SAME as 1999 ITRS)
  • MPU _at_Introduction/340mm2
  • MPU _at_Ramp/170mm2
  • c) SRAM and Logic Transistors/chip Trend (SAME
    as ITRS) 2x/2yrs
  • d) Chip Size Growth Rate Trend
  • WAS/ IS Flat chip sizes through 2001, then
    1.2x/4rs

11
Chip Size - Model Assumptions, Notes, Tables
12
Chip Size - Model Assumptions, Notes, Tables
(cont. - MPU)
13
Part 2 - DRAM Tables ( Note that target node
years for Scenario 2.0 are now proposed to be
1999/180nm 2001/130nm 2004/90nm
2007/65nm 2010/45nm 2013/33nm
2016/23nm)
14
This Page Left Intentionally Blank
15
(No Transcript)
16
(No Transcript)
17
(No Transcript)
18
(No Transcript)
19
(No Transcript)
20
DRAM - ORTC Chip Size Model Per IRC Technology
Node Proposal IS, 7/11/00 (cont)
21
Part 3 - MPU/ASIC Tables ( Note that target node
years for Scenario 2.0 are now proposed to be
1999/180nm 2001/130nm 2004/90nm
2007/65nm 2010/45nm 2013/33nm
2016/23nm)
22
This Page Left Intentionally Blank
23
(No Transcript)
24
(No Transcript)
25
(No Transcript)
26
(No Transcript)
27
(No Transcript)
28
This Page Left Intentionally Blank
29
Part 4 - Other ORTC Table TWG Line Items ( Note
that target node years for Scenario 2.0 are now
proposed to be 1999/180nm 2001/130nm
2004/90nm 2007/65nm 2010/45nm
2013/33nm 2016/23nm)
30
Other ORTC Table TWG Line Items - Table 2a,b
Litho Field Size Litho Wafer Size FEP, FI -
Table 3a,b of Chip I/Os Test, Design of
Package Pins/Balls Test, AP - Table 4a,b Chip
Pad Pitch AP Cost-Per-Pin AP Chip
Frequency Design Chip-to-Board
Frequency AP Max Wire Levels Interconnect -
Table 5a,b Electrical Defects Def. Reduct. -
Table 6a,b P.Supply Volt. PIDs Max.
Power Design, PIDs - Table 7a,b Affordable
Cost Economic (AA actg) Test Cost Test
31
(No Transcript)
32
(No Transcript)
33
(No Transcript)
34
(No Transcript)
35
(No Transcript)
36
(No Transcript)
37
(No Transcript)
38
(No Transcript)
39
(No Transcript)
40
(No Transcript)
41
(No Transcript)
42
(No Transcript)
43
(No Transcript)
44
(No Transcript)
Write a Comment
User Comments (0)
About PowerShow.com