Instrumentation of the Forward Region of a Linear Collider Detector Workshop at Prague 16 April 2004 - PowerPoint PPT Presentation

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Instrumentation of the Forward Region of a Linear Collider Detector Workshop at Prague 16 April 2004

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Title: Instrumentation of the Forward Region of a Linear Collider Detector Workshop at Prague 16 April 2004


1
Instrumentation of the Forward Region of a
Linear Collider Detector - Workshop at Prague
16 April 2004
  • LPI group
  • Lebedev Physical Institute, Moscow

2
Proposal
  • Use of GaAs as a sensor for LCAL
  • We considered two types of material as sensitive
    elements of GaAs detector
  • commercial semi-isolating plates (thickness
    100-200 mm)
  • epitaxial structures (thickness 30 mm) grown in
    Zelenograd
  • Choice of the material is a subject to study
  • Participants
  • Lebedev Physical Institute, Moscow
  • Laboratory of High Energy Electrons
  • Scientific and Educational Center on Quantum
    Devices and Nanotechnologies (joint venture of
    Lebedev
  • Physical Institute and Moscow Federal
    Institute of Electronic
  • Technology - Technical University (MIET))

3
History
  • Some tests were performed last year. For these
    tests we used
  • detectors of barrier type (metal-semiconductor or
    p-n junctions) with epitaxial layers of undoped
    GaAs as active layers (thickness 30 mm)
  • detectors of resistive type with commercial
    semiisolating GaAs (compensated EL2 deep level
    defects) as active layers
  • (thickness 150 mm)

4
Test results (last year)
  • Spectrometric measurements were performed -
  • GaAs detectors were irradiated by a-source (5.456
    and 5.499 MeV)
  • I, nA DE, keV S/N
  • I Mn-GaAsnG??s lt15 35
  • II MpGaAsn-GaAsnGaAs 7
    141
  • III Mn-GaAsnGaAs 45 15
    15
  • IV ?-iGaAs-M (EL2) 150 40
    10
  • I-III types - epitaxial GaAs layers, IV type -
    semiisolating GaAs,
  • I, nA - leakage current DE, keV - energy
    resolution S/N - signal to noise ratio
  • Conclusion detectors with epitaxial structure
    showed slightly better results
  • compared to semi-isolating
    one.

5
New party of GaAs detectors
  • To continue investigations recently (2004) new
    party of detectors with epitaxial layers of GaAs
    was made. Detectors were manufactured either as
    twin linear integrated structures or discrete
    cells.
  • Topology of the prepared detectors was
  • pGaAs - n-GaAs -nGaAs (substrate)
  • layer thickness 0.25 mm and 30 mm
  • substrate thickness 600 mm
  • dopant density 1018 cm-3 and 2.1013 cm-3

Discrete cells were made of different shape
(circle, ring) and different size (50 mm - 2
cm). In preparing new party of GaAs samples
mesa-epitaxial approach was used.
6
Detectors description of structure
  • Two types of detectors were used
  • twin linear integrated structure of galvanically
    disconnected recording cells separated with the
    guard rings
  • discrete detection cells separated with the usage
    of guard rings
  • Detectors had following contacts
  • ohmic (Ge/Ni/Au) - to heavily-doped nGaAs
    substrate from the back-side of the structure
  • barrier (V-Au) of circular (or annular) shape -
    to doped epitaxial layers from front-side of the
    structure
  • common guard ring in the case of twin linear
    integrated sructures and Guard electrods
    (three-ring type) in the case of discrete cells
  • GaAs detectors were placed in a special casing

7
Test results
We started measurements of the parameters of new
GaAs detectrors. We performed spectrometric
measurements GaAs detectors were irradiated by
a-source.
  • I, nA DE, keV S/N
  • ?3 mm lt50 120 4
  • ?10 mm lt200 1.5
  • ?20 mm lt1000 1
  • ?200 mm lt1 -
  • First results on DE were worse than those
  • obtained on samples of last year. We could not
  • optimize measurement procedure because of the
  • time deficit.Measurements will be continued.
  • There are also plans to extend measurements to
  • the region of high energies (hundreds MeV
  • and GeV region).
  • Preliminary tests of uniformity for linear
    integrated
  • structures gave accuracy (in summary signal)
  • about 10 .

8
Simulation of the LCAL
  • To compare characteristics of two different
    materials as sensitive layers of detector we
    (besides direct measurements) made first
    attempts of MC simulation of energy deposited in
    active layers
  • of calorimeter
  • Simulation have been made by using Geant4 package
  • We used simple geometry
  • 1) 63 layers W 2 mm, GaAs 300 ?m
  • 2) 63 layers W 2 mm, Si 300 ?m
  • 3) 63 layers W 2 mm, GaAs 30 ?m
  • Primary particle e- , energy 1 GeV

e- , E1 GeV
9
Simulation of the LCAL
  • Primary particle e- , energy 1 GeV
  • Geometry
  • 1) 63 layers W 2 mm, GaAs 300 ?m
  • 2) 63 layers W 2 mm, Si 300 ?m
  • 3) 63 layers W 2 mm, GaAs 30 ?m
  • Results
  • Signal from calorimeter with GaAs sensor is
  • two times larger than signal from Si sensor
  • when thicknesses are equal.
  • In case of epitaxial layer with thickness of
  • GaAs 30 ?m energy deposited in active
  • layers of the calorimeter is several times
  • smaller than that from thick sample of Si.
  • To make final conclusion further MC
  • simulations are required.

e- , E1 GeV
10
Advantages and disadvantages
  • GaAs detector on epitaxial layers has following
    advantages compared to the case of semi-isolating
    layers
  • low noise level
  • smaller values of working voltage
  • larger temperature range of stable work
  • (especially compared to Si)
  • and disadvantage
  • low level of signal (energy deposited in active
    layers of the calorimeter)

11
Directions of studies
  • At present there are at least two directions of
    developing
  • material parameters suitable for use in LCAL
  • Preparation GaAs epitaxial layers with larger
    thicknesses
  • (up to 100 ?m).
  • In this case we shall have signal (energy
    deposited in active
  • layers of the calorimeter) compared with that
    obtained in case
  • of Si -sensor.
  • Decreasing concentration of EL2 deep level
    defects (in the case of semi-isolating GaAs)
    without increasing background concentration of
    carriers.
  • (First samples with considerable decreasing of
    EL2 defects
  • concentration were obtained).
  • It will allow to decrease noise level

12
Plans tests in Russia
  • Special setup is being preparing now for
  • measurement of parameters GaAs detectors
  • We intend to perform
  • full-scale electrophysical tests of GaAs
    detectors
  • spectrometric measurements using radioactive
    source
  • Single channel amplifier was prepared on the
    basis of GaAs epitaxial layers
  • We hope to use this amplifier for realization
    spectrometric
  • measurements on electron beam (Emax 600 MeV) of
  • Synchrotron S-60 (Lebedev Physical Institute)
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