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Title: Nanopatterning of Silicon Carbide by UV and Visible Lasers.


1
Nanopatterning of Silicon Carbide by UV and
Visible Lasers.
  • By
  • Arvind Battula
  • 12/02/2004

2
Properties of SiC.
  • Wide-gap semiconductor.
  • High thermal conductivity.
  • Low thermal expansion coefficient.
  • High melting point.
  • High hardness.
  • High breakdown electric field.
  • High electron saturation.
  • Suitable for high temperature, power and
    frequency applications.

3
Photetching of SiC by VUV-266nm Multiwavelength.
Zhang, et. Al., 1996, Direct photoetching of
single crystal SiC by VUV-266 nm multiwavelength
laser ablation, Appl. Phys. A,64, p.367.
4
Femtosecond Pulsed Laser Induced 3C/SiC surface
Morphology.
Pulse duration 120 fs wavelength 800 nm
Dong.Y., and Molian. P., 2003, Femtosecond
pulsed laser ablation of 3C-SiC thin film on
Silicon, Appl. Phys. A, 77, p. 839
5
Monolayer of SiO2 Nano-spheres on SiC.
SEM micrograph of the monolayer of silica spheres
diameters (a) 1.76 µm and (b) 640 nm.
6
Experimental Setup.
Schematic of (a) experimental setup, (b)
Irradiation of the spheres on SiC.
7
? 532 nm, 640 nm Silica Spheres, 400 nm SiC
film.
525 mJ/cm2
425 mJ/cm2
8
? 532 nm, 1.76 µm Silica Spheres, 400 nm SiC
film.
200 mJ/cm2
275 mJ/cm2
325 mJ/cm2
400 mJ/cm2
9
? 355 nm, 640 nm Silica Spheres, 400 nm SiC
film.
400 mJ/cm2
300 mJ/cm2
500 mJ/cm2
10
? 355 nm, 1.76 µm Silica Spheres, 400 nm SiC
film
225 mJ/cm2
175 mJ/cm2
350 mJ/cm2
225 mJ/cm2
11
Gradual Changes in the Melting Zone of one Laser
Spot.
12
? 532 nm, 250 nm Gold Spheres, 300 mJ/cm2 , 200
nm SiC film.
13
? 355 nm, 250 nm Gold Spheres, 425 mJ/cm2 , 200
nm SiC film.
14
Features for 355 nm Laser on Bulk SiC.
Features formed on the SiC substrate with a 355
nm laser (a) 1.76 µm diameter spheres and 950
mJ/cm2 and (b) 640 nm diameter spheres and 850
mJ/cm2.
15
AFM Results for 355 nm Laser.
Variation in the feature size with respect to the
laser intensity for 355 nm laser and 1.76 µm
spheres.
16
Features for 532 nm Laser on Bulk SiC.
Features formed on the SiC substrate with a 532
nm laser (a) 1.76 µm diameter spheres and 2
J/cm2 and (b) 640 nm diameter spheres and 6 J/cm2.
17
AFM Results for 532 nm Laser.
AFM cross section view of the features obtained
with 532 nm laser and 1.76 µm spheres.
18
Ablation Mechanism.
  • At low laser fluence the formation of
    laser-induced nanostructures are from
    defect-activation.
  • The pre-existing defects facilitate local
    absorption of incident laser.
  • This results crystalline SiC to lattice disorder
    due to electronic excitation.
  • Weakens interatomic bonding and thus lower the
    vibrational energy required for lattice disorder.
  • With increasing laser-induced lattice defects,
    the formation of grain boundries results in
    polycrystallization of SiC film.

19
Non-Thermal Transitions in Semiconductors.
S.K. Sundaram and E. Mazur, Inducing and Probing
Non-Thermal Transitions in Semiconductors Using
Femtosecond Laser Pulses, Nature Materials, 1,
217-224 (2002).
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