Title: Sonic Spray Mass Spectrometry Mechanism and Characteristics
1Sonic Spray Mass Spectrometry Mechanism and
Characteristics
- Sonic Spray Ionization
-
- Sonic Spray Setup and conditions
- How? Charged Droplet Formation and Ionization
process - Example Spectral Characteristics
2Atmospheric Pressure Sonic Spray Conditions
- Sonic Spray Flow Conditions
- Coaxial flow of nitrogen at 3-4 L/min
- Fused silica capillary (0.1mm ID)
- Voltage can be used to enhance droplet charge
density - Multi-hole plate to diffuse spray gas
3Mechanism of Charged Droplet Formation by Sonic
Spray
- Charged Sonic Sprayed Droplets
- Dependent on surface potential and non-uniform
ion concentrations at surface - Fission of droplets
- Shear stress ? charged droplets
- Non-uniformity of positive and negative ion
concentrations can be enhanced by an external
electric field - At Sonic gas flow, a droplet undergoes fission
and charged droplets produced
Non-uniformity of positive and negative ion
concentrations are generated near the droplet
surface due to the surface potential
Formation of fine charged droplet from a neutral
droplet in which the positive and negative ion
concentrations are not uniform
4Sonic Spray Characteristics
- Characteristic Features
-
- Shear stress --? charged droplet formation
- Ion Intensity dependent on gas velocity
- Fine charged droplets dependent on gas velocity
(based on ion current measurements) and much less
dependent on solution flow rate - Droplet size minimum at sonic velocity
- Sonic Spray Ionization - Fine charged droplets
and ions are produced. Ion Desorption Ion
Evaporation Model
Ion Intensity as a function of the gas flow rate.
It has also been shown that Ion current shows a
very similar dependency on flow rate
5Sonic Spray Spectral Characteristics Example
of Similarity to ESI
Okadaic Acid SSI-MS Spectrum
6Sonic Spray Spectral Characteristics - Chitosan
Oligosaccharide
Chitosan Pentamer C30H57N5O21 M.W.823
Chitosan Hexamer C36H68N6O25 M.W.984
7SSI-MS Spectrum of Ganglioside-GM1
Sonic Spray Ionization Negative ion mode
8Acknowledgment
Central Research Laboratory, Hitachi Tokyo
Japan Atsuma Hirabayashi, CRL, Hitachi Tokyo
Japan