Title: Ultrafast Laser Ablation and Plasma Diagnostics
1 Ultrafast Laser Ablation and Plasma Diagnostics
- Zhiyu Zhang
- Center for Ultrafast Optical Science
- Department of Electrical Engineering and Computer
Science - University of Michigan, Ann Arbor, MI
2Outline
- Introduction and Motivation
- Multi-diagnostic comparison of plasmas by
ultrafast laser and nanosecond laser ablation - Multi-pulse ablation
- Application of double and multi-pulse ablation
isotope enrichment and clusters formation - Summary
3Ultrafast Laser Applications Materials
Processing (I)
Above Ablation Threshold
- Micromachining metal, semiconductor, dielectric,
dental tissue, 100nm lateral, 10nm vertical
Appl. Phys. A 68 369, Appl. Phys. A 68 403 - DNA transfection Nature 418 290
- Patterning biomaterials Appl. Surf. Sci. 208-209
245 - Fresnel zone plate fabrication Opt. Exp. 10 978
- Surface microstructureing APL 81 1999
- Photomask repair J. Vac. Sci. Technol. B 21 204
4Ultrafast Laser Applications Materials
Processing (II)
Below Ablation Threshold
- Waveguide direct writing Opt. Lett. 21 1729
- Phase transition JETP Lett. 76 461
- 3D micro-photopolymerization
- Nature 412 697
- Nonlinear optical coefficient enhancement APL
81 1585 - Precipitating nanoparticles inside glasses APL
81 3040
5Ultrafast Laser in Materials Processing
6Ultrafast Laser System
10 Hz X 10,000 200 ps
Beam Splitter
Stretcher
7Ultrafast Laser System
100 fs 10 Hz 100 mJ
8High-Repetition Rate Commercial Ultrafast Laser
Laser 1 kHz, 1 mJ/pulse, 150 fs
9Experimental Setup
10Electrostatic Energy Analyzer
Select ions with E/q2.254 ?Vs
11Time-of-Flight Spectrum BN
- Laser 100 fs, 780 nm, 50 J/cm2
12Time-Resolved OESAl Ablated with 100-fs Pulses
- 100 ns Delay Increment
- 50 ns Acquisition Window
- 100, 780nm, 1J/cm2 Laser Pulses
- Continuum Emission at Early Time
13Langmuir Probe I-V Curve
- Plasma parameters related to the different
regions of the I-V curve - Probe theory developed to extract the parameters
from the I-V curve - Time-resolved analysis (1ms resolution)
14HeNe Probe Laser Deflection
Plume
Quad Detector
Vout
HeNe
j Ion or Neutral component
Self-similar expansion model for both ion and
neutral species
C.L. Enloe et al, Rev. Sci. Instrum. 58, 1597
(1987)
15HeNe Deflection Signal
BN Ablation 6ns, 18 J/cm2
Parameters Vion 4.76x106cm/s Vneutral 1.04x106c
m/s Nion 5x1014 Nneutral 1x1017
16In-situ Analysis Plasma Diagnostic Technique
- Electrostatic Energy Analyzer
- Charge state, Ion energy distribution
- Langmuir Probe
- Electron temperature, Plasma and floating
potential, Density of electrons and ions - Spatial and temporal resolution (1ms)
- Optical Emission Spectroscopy
- Plasma temperature, Excited states
- ns time resolution
- Laser Deflection Probe
- Ion to neutral ratio
- Hydrodynamic component
Target Metal (Al), Nitrides (BN), Oxide (SnO2)
17Energy Spectrum of AlEffect of Laser Pulse Width
80 fs, 780 nm 0.4J/cm2
Al Target Ablated in Vacuum
18Time-Resolved Electron Temperature Optical
Emission Spectroscopy
- Laser Pulses
- 6ns
- 1.06mm
- 1.4J/cm2
- 100fs
- 780nm
- 0.4J/cm2
-
19Time-Resolved Electron Temperature Langmuir
Probe
6 ns
80 fs
Laser pulses 80fs 780nm 0.4J/cm2 6ns
1.06mm 1.3J/cm2 Langmuir Probe 10cm away from
Al target
20HeNe Deflection Ion to Neutral Ratio
100 fs Laser Neutral Energy4 eV Ion Energy 85eV
6 ns Laser Neutral Energy4 eV Ion Energy 100eV
21Plume Properties Modified by Laser Pulse
- Pulse width plasma shielding and heating effects
- Pulse contrast enhance the high energy component
in the plume (Appl. Surf. Sci 2000) - Pulse intensity optimum ablation efficiency (MRS
2002) - Multi-Pulse enhanced ion properties (APL 2003)
22Ion Yield and Energy in Ablation Plumes
3.3kJ/cm2
- 10Hz
- TiSapphire
- Same focus spot
- Varying pulse
- energy
- Ion Energy is converted from TOF signal
0.8kJ/cm2
23Laser Wave in Plasma
ncr
Light Wave in Inhomogeneous Plasma s-pol
Collisional absorption p-pol Collisional
Resonance absorption Collisional
absorption Resonance absorption
w laser frequency L plasma scale
length vie electron-ion collision
frequency c speed of light
24Modify the Ablation Dynamics by Double Pulse
Ablation
- Saturation of absorption occurs as single- pulse
energy increases due to plasma reflection - Use an appropriately time-delayed secondary laser
pulse to add energy into the plasma during the
early stages of its expansion. - Examine the effect on the plasma and the clusters
25Double pulse experiment
- Initial gradient scale length of a plasma
- Two identical 300fs pulses tens of ps delay
- Ref C. Y. Cote et. al Phy. Rev. E 56, 992 (1997
) - Thin Film Deposition reducing particulate
- CO2 and YAG lasers 4ns delay
- Ref S. Witanachchi, et. al Appl. Phys. Lett. 66
1469 (1995) - X-ray emission
- Weak pre-pulse, 2ns delay
- Ref H. Nakano et. al Appl. Phys. Lett. 79 24
(2001)
26Time-of-Flight Single vs. Double-Pulse
Laser 110fs, 780nm, p-polarized
1x1016 W/cm2
050ps
2x1016 W/cm2
27Ion Yield and Energy vs. Delay
28Optical Emission Spectroscopy Si Target
29Double-Pulse Enhanced Optical Emission
Laser 130fs, 780nm, p-pol
1x1016 W/cm2
050ps
30Langmuir Probe Double-Pulse Enhanced Ion Density
Laser 130fs, 780nm, p-pol
1x1016 W/cm2
050ps
31Charge State Distribution Single vs.
Double-Pulse
Average Charge Single 2.5 Double
5-ps 3.1 Double 10-ps 3
32Resonance Absorption of Time-Delayed Pulse
33Plasma Scale-Length Results
34Ion Yield vs. Laser Intensity (Double-Pulse)
Maximum Intensity 1x1016 W/cm2
35Setup for Generation of 4-pulse Sequence
36Silicon Ablation by Multi-pulse
Laser Intensity 5x1015 W/cm2 Four-Pulse t15ps,
t3 is a variable
37Isotopic Enrichment Double-Pulse Enhancement
BN Ablation 120 fs, 2 x 1016 W/cm2, Dt 10 ps
Isotope Ratio
Ion Yield
38Time-resolved Magnetic Field
Magnetic field by RA Laser Intensity 1x1016 W/cm2
Toroidal magnetic field Laser Intensity 5x1018
W/cm2
Borghesi et.al. PRL v81,p112
Sandhu et.al. PRL v89,p225002
39Questions
- Cluster component in the plume?
- Surface roughness is caused by growth effect or
clusters formed in plume? - High intensity femtosecond plasma bursts result
in dense cluster formation?
40Cluster Formation for Cu/NiLaser intensity 2 x
1016 W/cm2 Tm 1300 C
41Cluster Formation for SmCo
42Cluster Formation for NdFeB
43Cluster Size Distribution Ni
Ni RT, 10Hz Laser, Single Pulse, 2x1016W/cm2
Average Size 242 nm 155nm
44Cluster Size Distribution Ni
Ni RT, 10Hz Laser, Double Pulse, 1x1016W/cm2,
5ps Delay
Average Size 99nm41nm
45Cluster Size Distribution Ge
Single full-energy pulse
46Cluster Size Distribution Ge
Double pulse
47Clusters Formation Mechanism (I)
- Condensation of ns laser ablation plume
- High background pressure, 1 10 Torr
- Hydrodynamic expansion and thermodynamic
condensation - Plume nonuniformity gives cluster size
distribution - Average size less than 10 nm
48Clusters Formation Mechanism (II)
- Photomechenical Effects - fragmentation
- Clusters are formed by fragmentation due to the
strain associated with gradient of expansion
velocity - Cluster size determined by fragmentation time
- Average size less than 10 nm for 1ps
fragmentation time
49Clusters Formation Mechanism (III)
- Photothermal Effects phase explosion
- Superheating leads to homogeneous nucleation
- Mixture of vapor and liquid forms clusters
- Average size possible 100 nm
50Femto-Jet nozzle
Hagena Equation
Femtosecond laser ablation P0 103 104 atm a
small, supersonic expansion Density very
large k large for heavy atoms
d jet throat diameter a jet expansion half
angle p0 backing pressure T0 initial gas
temperature k material dependent constant
number of atoms per clusters Nc ? (G)2.02.5
51Ablation PlumeFemto-Jet Nozzle
Cluster condensation
52Femto-Jet Application
- Cluster-Laser Interaction
- X-ray emission
- Higher energy ions (MeV) and high charge
- Femto-Jet
- High backing pressure 103 104 atm (normal nozzle
10 atm) - Supersonic expansion
- Not limited to gas species
- Jitter-free interaction
53Summary
- Comparative study of ultrafast laser and
nanosecond laser ablation - Plume in far field ions, neutrals and clusters
- Plasma can be optically pumped with resonance
absorption of a time-delayed laser pulse - Application of multi-pulse ablation isotope
separation enhancement and cluster formation
54Acknowledgements
Peter Pronko Paul VanRompay John Nees Gerard
Mourou Roy Clarke Steve Yalisove Xiaoqing Pan
Paul Torek Chris Stewart Kyoungsik
Kim Seung-Whan Bahk Wei Tian Juan Dominguez