Ordering Transition of Block Copolymer Thin Films Abraham Arceo, Peter F. Green The University of Te - PowerPoint PPT Presentation

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Ordering Transition of Block Copolymer Thin Films Abraham Arceo, Peter F. Green The University of Te

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Title: Ordering Transition of Block Copolymer Thin Films Abraham Arceo, Peter F. Green The University of Te


1
Ordering Transition of Block Copolymer Thin
FilmsAbraham Arceo, Peter F. GreenThe
University of Texas at Austin (DMR-0072897)
BULK PHASE DIAGRAM (cN)bulk-ODT10.5
  • A-b-B diblock copolymers self-organize into a
    range of geometrical patterns (spheres, lamellae
    etc.) below an order-disorder transition
    temperature, TODT. For bulk symmetric copolymers,
    which form lamellae of spacing L, the transition
    occurs when ?Ngt10.5, where N is the number of
    monomers per chain and ? (1/T) is an energetic
    interaction parameter.
  • Finding
  • The transition occurs when ?Ngt7.94 for a film
    (hlt2L) of PS-b-PMMA copolymer supported by SiOx,
    corresponding to a decrease of TODT by
    approximately 250 degrees.
  • In a solvent environment, supercritical CO2,
    which exhibits a preferential affinity for PMMA,
    the TODT is shifted significantly below the bulk,
    and below that of the supported film in
    air/vacuum.

Lamellar (order)
disorder
Shift of Thin film ODT (cN)film-ODT7.94 (cN)bulk-
ODT10.5
Journal of Physical Chemistry B (LETTER),109,
6958 (2005)
2
Broader Impact
  • A-b-B diblock copolymers, depending on the
    chemical characteristics of the A and B
    components, are used for a wide range of
    applications, from devices and sensors to
    structural applications. Many of the new
    applications involve thin films. Upon increasing
    temperature, these materials self-organize. Our
    results show that the ordering temperature for
    thin, supported films, can be considerably lower,
    200 degrees, than the bulk ordering temperature
    (enhanced incompatibility between the A/B
    segments).
  • Secondly, solvents are often used to process
    block copolymers because they not only plasticize
    the copolymer, but they also make the system
    thermodynamically more compatible. Our results
    reveal that in cases where the solvent exhibits a
    preferential affinity for one component (PMMA in
    this case), that the thin, supported, film may
    become more incompatible than one would
    anticipate. This could have significant
    implications for low temperature processing of
    these systems.
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