STRUCTURAL AND BIAS VOLTAGE EFFECTS ON THE FREQUENCY RESPONSE OF InGaAs InP PHOTODIODES - PowerPoint PPT Presentation

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STRUCTURAL AND BIAS VOLTAGE EFFECTS ON THE FREQUENCY RESPONSE OF InGaAs InP PHOTODIODES

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CSNDSP'06 19-21 July 2006 Patras, Greece. INTRODUCTION. p-i-n Photodiodes ( ) easy to fabricate ( ) good frequency response ( ) low noise ( - ) low sensitivity ... – PowerPoint PPT presentation

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Title: STRUCTURAL AND BIAS VOLTAGE EFFECTS ON THE FREQUENCY RESPONSE OF InGaAs InP PHOTODIODES


1
STRUCTURAL AND BIAS VOLTAGE EFFECTS ON THE
FREQUENCY RESPONSEOF InGaAs/ InP PHOTODIODES
  • Jorge Manuel Torres Pereira
  • Institute of Telecommunications/DEEC - IST
  • Lisbon, PORTUGAL

CSNDSP06

19-21 July 2006

Patras, Greece
2
  • SUMMARY
  • Introduction
  • The Device Structure
  • Simulation Model
  • Results
  • Conclusions

CSNDSP06
19-21
July 2006

Patras, Greece
3
INTRODUCTION p-i-n Photodiodes () easy to
fabricate () good frequency response () low
noise ( - ) low sensitivity
Compound semiconductor materials III-V e.g.
InGaAs, InP,...
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Patras, Greece
4
THE DEVICE STRUCTURE
Schematic of the p-i-n structure used in this
work. The figure shows the light incident from
the left.
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5
SIMULATION MODEL
The continuity equations
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In the absorption region
a absorption coefficient f1 amplitude of the
sinusoidal optical flux q magnitude of the
electron charge
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Solving the continuity equations for each layer,
the electron and hole current densities at the
boundary on the right may be related to the
current densities at the boundary on the left by
Ti the current transfer matrix current
source vector
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8
The total current density, for a structure with N
layers, may be written as
where
which may be written as
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9
For the union of two layers the quantities T,
and D follow a simple set of rules
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The output current densities Jp(la,w) and Jn(0,w)
may be related to the input current densities
Jp(0,w) and Jn(la,w) through quantities which may
be expressed in terms of T, and D.
In this case the total current density is
obtained by
with
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11
The Ti, values for the
ith layer
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12
The electric field profile in the absorption
region
where Ud is called the punchthrough voltage,
given by
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13
The drift velocity as a function of the electric
field
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14
Empirical expressions for v(E)
mn 1.05 m2V-1s-1 mp 0.042m2V-1s-1 vnl
6x104 m/s vpl 4.8x104 m/s b 7.4x10-15
(m/V)2.5 g 2.5
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15
Table I Material parameters
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16
RESULTS
.
Simulated frequency response of p-i-n structures
with different absorption region widths and bias
voltages
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17
.
The 3-dB bandwidth as a function of the bias
voltage for several values of the absorption
region width
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The 3-dB bandwidth as a function of the bias
voltage for several values of the residual donor
concentration
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19
The 3-dB bandwidth as a function of the
absorption region width for several values of
the bias voltage
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The 3-dB bandwidth as a function of the
absorption region width for several values of
the residual donor concentration
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CONCLUSIONS
  • The results from the simulations seem to agree
    quite well with those from the experiment.
  • The frequency response is mainly dependent on the
    absorption region width, with shorter devices
    having a wider bandwidth.
  • The 3-dB bandwidth is seen to be dependent on
    bias and doping concentration only for devices
    with large absorption region widths. In this case
    the bandwidth increases when the bias voltage
    increases and the doping concentration decreases.

CSNDSP06

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22
THANK YOU FOR YOUR ATTENTION
CSNDSP06

19-21 July 2006

Patras, Greece
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