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9 Applications of BJT

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In order to conserve space, work at lower beta than small-signal BJTs. ... wide E/narrow contact Xmas tree. efficient use of space && better than xmas tree ... – PowerPoint PPT presentation

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Title: 9 Applications of BJT


1
9 Applications of BJT
2
9.1 Power BJT
  • Because of high-Ic rolloff (gt1.5uA/um2), emitter
    area increases. In order to conserve space,
    work at lower beta than small-signal BJTs. b
    min. acceptable 10 (power NPN can handle 8-15
    uA/um2).
  • Lateral PNP can not achieve more than 250uA/
    min.emitter
  • Small-signal BJT can handle 10 mA, 100 mW
  • Power BJTs for gt100mA, gt500mW need special
    layout, up to as high as 10A 100W
  • Most IC power NPN Ilt2A Plt10W
  • Power PNP Ilt500mA.

3
Failure of Power NPN
  • Emitter debiasing
  • thermal runaway
  • secondary breakdown

4
(A) Emitter debiasing some Tr may not even
conduct
Ex) suppose Ie 50mA, R 1.2mW each ? total
Volt drop 50mA 1.2mW 100mA 1.2mW 150mA
1.2mW 3.6mV ? DIe/Ie e3.6mV/26mV -1 1.15 -1
15
5
(A) Emitter debiasing some Tr may not even
conduct
Ex) suppose Ie 50mA, R 1.2mW each ? total
Volt drop 50mA1.2mW 100mA1.2mW
150mA1.2mW 3.6mV ? DIe/Ie e3.6mV/26mV -1
1.15 -1 15
15 morecurrent than Q1 !
Ve1
Ve1-3.6mV
6
  • (B) Use Emitter Ballasting R
  • to reduce impact of E debiasing
  • Insert R at Emitter node
  • typically 50-75mV drop at max full rated current
  • Ex) 50mA Em. ? 1W R

7
  • (B) Use Emitter Ballasting R
  • to reduce impact of E debiasing
  • Insert R at Emitter node
  • typically 50-75mV drop at full rated current
  • Ex) 50mA Em. ? 1W R
  • Ex) (1) 3.6mV debiasing ? (2) current change in
    Ballasting Rs ? (3) change in Emitter terminal
    voltage

DVe -1.8mV
50mA1.8mA
1W
50mA-1.8mA
DVe 1.8mV
D -1.8mV
D 1.8mV
8
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9
Voltage drop should not exceed 5mV
2
Emitter contact
1
? Because exp(5mV/25mV)-1 1.22-1 22
difference between IE1/IE2
DVBE L Rs IE / 2W
Ex) 50mA along the length of 300um (L), 30um (W),
and 12mW/sq (Al, Rs) ? 3001250/230 3mV
acceptable
Emitter Current Flow Direction
10
Thermal Runaway
dVBE/dT - 2 mV/C --- initially starts
with E debiasing
Hot spots conduct more current !
Secondary Breakdown If JE gt Jcrit VCE gt VCEO2
? leads to overheating metallization failure
Example BJT driving inductive load ? vulnerable
to secondary breakdown
? Keep IE lt 8-15uA/um2
11
Layout of Power NPN
  • Linear-mode NPN
  • operates in Active mode for long time
  • large VCE, large Ic ? large Power dissipation ?
    must have a large Area to dissipate heat
  • General rule limit Power lt 150 uW/um2, IE lt 10
    uA/um2
  • Switched-mode NPN
  • lower VCE VCE,sat (about 0.2V) operates
    between Cutoff lt-gt Saturation
  • Power diss. during brief Switch interval only
    Average power diss. is small
  • can withstand higher Power dissipation but IE
    focusing a problem during turnoff
  • Limit to IE lt 20 uA/um2.
  • Pulsed-mode NPN
  • NPN operates in pulsed mode when driving
    Capacitive-loads
  • conducts large Ic only for a few 100ns rests
    for a few ms.
  • unharmed by IE focusing because external C will
    quench conduction,
  • immune to thermal runaway, high-Ic beta rolloff
    and high Rc limits Ic
  • pulse duration not to exceed 1 ms, intervals
    greater than 250 ns.
  • IE,ave not to exceed 20 uA/um2.

12
Layout of Power NPN
Linear-mode PE lt 150 uW/um2, IE lt 8 uA/um2
Switched-mode less average Power during
operation. IE lt 16uA/um2 Pulsed-mode Large
current during a few 100 nS, immune to thermal
runaway ex) Capacitive load like MOS gate
Interdigitated-Emitter NPN oldest style,
higher speed
13
  • Two emitter Ballasting Rs
  • extremely vulnerable to inter-finger debiasing
    must be DVinterfinger lt 5mV
  • Large of short fingers better than small of
    long fingers
  • compromised finger widths 8-25 um
  • Emitter contact as large as possible to reduce RE

14
- Previous geometry Base metallization
comb-style
- Below is Serpentine-style Base metallization
15
Wide-Emitter Narrow-Contact NPN
  • Narrow Emitter Fingers
  • Good for high freq. due to low RB
  • good for controlling Emitter crowding
  • bad for intrafinger debiasing (concentrates
    conduction at one end of finger)
  • ? individually ballasted sections (no one finger
    can conduct too much)
  • ? use wide emitter, narrow contact for similar
    effect (distributed network of
    ballasting resistors)

16
Christmas-tree Power NPN
  • Widely used in Linear-mode app due to resistance
    to thermal runaway
  • Rarely used for switching app
  • Emitter central spine triangular prongs
  • most conduction in triangular prongs
  • Emitter ballasting naturally built in
  • At low Ic all parts high Ic only triangular
    prongs
  • best for app that dissipates high power

17
Cruciform-emitter NPN
  • Emitter width 75-125um for added ballasting
  • Em.contact locations ? distributed 3D ballasting
  • wide E/narrow contact Xmas tree
  • efficient use of space better than xmas tree
  • two drawbacks
  • small Em.contacts ? electromigration
  • compact size can cause extreme local heating
  • Best suited for Switching app.

18
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19
Power Transistor in Analog BiCMOS
  • can operate at IE gt 150 uA/um2
  • overlap of E over contact 8-12 um
  • DeepN 8 um wide
  • All forms of Power NPN above plus

Wide-emitter, narrow-contact in BiCMOS
  • Currents (IE, IC, IB) flow out thru Metal-2 v
    thru Viafrom Metal-1
  • minimizes Rc
  • blocks substrate injection during sat

To Metal-2
Diffusion masks
Metal-1 masks
20
Saturation (CBJ) detecting limiting
Two examples of PNP to limit saturation
21
Switching NPN Transistor -- example
  • minimizes Rc
  • blocks substrate injection during sat
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