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Coaxial Thermal Converter

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SF6/Ar reactive ion etching alternating with fluorocarbon conformal passivation ... High Si etch rate 3 mm/min. Good selectivity to photoresist ( 50:1) and ... – PowerPoint PPT presentation

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Title: Coaxial Thermal Converter


1
Coaxial Thermal Converter
100 series connected thermocouples
EvanOhm heater
Membrane Boundary
Silicon obelisk
Au
Si (Substrate)
SiN
Cross section of chip
Thermocouple
Heater
Si (Obelisk)
2
HARSE/Bosch Etching
  • SF6/Ar reactive ion etching alternating with
    fluorocarbon conformal passivation to prevent
    sidewall etching
  • High-aspect ratio 201
  • High Si etch rate 3 mm/min
  • Good selectivity to photoresist (501) and other
    materials
  • Compatibility with standard processes like CMOS

2) SF6 /Ar Etch
1) Passivation
Silicon Substrate
3
Fabricated TVC Die
  • EvanOhm heater for TVC (200 W to 1000 W)
  • Gold heater for TCC (0.1 W to 5 W)
  • Examining new designs for high current

Heater
Thermocouples
Membrane Boundary
4
ObeliskFormation
Frontside View
50 mm
Si Obelisk Boundary
Thermocouples
Heater
Inner Substrate Edge
Backside View
5
100 mm Wafer
6
LF10b Bifilar FMJTC
Bonding Pads
Thermocouples
Heater
Membrane Boundary
Obelisk
7
LF10c Coaxial FMJTC
Bonding Pads
Thermocouples
Heater
Membrane Boundary
Obelisk
8
Solid Modeling and Automatic Meshing CUBIT
SJTC
FMJTC
Journal Files Simplify Changes in Geometry
9
Steady State Simulation Result for Two Heater
Styles
  • Simulation shows membrane region. Simulation is
    3D, obelisk extends into the page beneath heater
  • Low-frequency performance improved through
    elimination of residual heating effect in region
    between obelisk and substrate edges
  • No additional mask layer (as in compensation
    technique)
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