Nanorod formation for the electrotherapy

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• Nanorod formation for the electrotherapy

http//nanotechweb.org/cws/article/tech/37573/1/08
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Dingjun. Huang 2009/06/ Q26974027
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1. Motivation
1.Making an innovational design and application
of micro/nano technology, using the skill learned
last semester. 2.Nanopillar is potential for
following application
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2. Experiment structure
2.1 Wafer cleaning

• Prepare Si (100) wafer, submerge in the acetone
  with ultrasonic oscillation 5mins.
• DI water clean, then submerge in the IPA with
  ultrasonic again.
• DI water clean, then blow to dry.
• Acetone then IPA, DI water and dry, place over
  the hot plate 110C, 5mins.
• With a 126 solution of NH4OH , H2O2 and water
  at 80C for 15 min clean Si is the high class way.

2.2 PS preparation and coated

• The PS spheres in solution with Acetone.
• Dry in room temp.
• Then anneal at 80C, 1hr

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2.3 RIE parameter

• Flow rate, 40 sccm CF4 gas, RF 40 W,
• 5min

2.4 PS removed

• Clean with Acetone unless no effect, just used
  the THF.
• When removed, the first step depth are appeared.

2.5 Oxidation removed (selected)

• Oxidation chamber 1000C, 4-5hr
• Use the HF to removed the oxide layer
• Etch time?

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2.6 Observation

• Use the nanofocus or AFM to observe the profile
  of the surface.

2.7 Application

• Clean with Acetone unless no effect, just used
  the THF.
• When removed, the first step depth are appeared.

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2.8 Materials

• Si (100)wafer office
• PS (polystyrene) spheres buying
• DI water Center offering, washing Si.
• Tetrahydrofuran (THF) buying
• RIE Center offering, CF4 is used,
• Oxidation Center offering
• Ultrasonic setup Center offering.
• Nanofocus Center offering, the measuring
  standard for um scale at least.
• AFM and its tips if need
• Other unknown maybe need

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3. Future work

• Going on my next work to detect.

One world one dream
Thank you for your attention!