Self-assembly Nanostructure and Lithography - PowerPoint PPT Presentation

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Self-assembly Nanostructure and Lithography

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Self-assembled epitaxical quantum nanostructures are a class of nanostructures ... blurring of the edges of features because at atomic scale they don't diffract. ... – PowerPoint PPT presentation

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Title: Self-assembly Nanostructure and Lithography


1
Self-assembly Nanostructure andLithography
  • Prepared by
  • Thu Nguyen

2
Self-Assembled Nanostructures
  • Self-assembled epitaxical quantum nanostructures
    are a class of nanostructures created by
    exploiting naturally occurring forces between the
    constituents, usually atoms and/or molecules, and
    a crystalline substrate such that the atoms of
    the resulting nanostructure have a definite
    spatial relationship with the underlying
    substrate atoms.
  • Since the nanostructures form during a film
    growth process, rather than through post-growth
    patterning and etching on the nanoscale, these
    have been dubbed self-assembled (or
    self-organized) nanostructures.

3
The directed self-assembly process can produce
large, virtually perfect arrays of bent lines at
the nanoscale. Such arrays could form the basis
of nanoscale electronic devices.
4
Electron-beam Lithography
  • The technique in brief consists of scanning a
    beam of electrons across a surface covered with a
    resist film sensitive to electrons, thus
    depositing energy in the desired pattern on the
    resist film.
  • Write lines with widths of only a few nanometers
    in a layer of photoresist on a silicon substrate.
  • Electron beams do not cause blurring of the
    edges of features because at atomic scale they
    dont diffract.
  • Can be done at nano-scale, as compared to
    photolithography, which is done at micro-scale.
  • Expensive and impractical for large-scale
    manufacturing because the beam of electrons is
    needed to fabricate each structure, thus the
    process can be done with one line at a time.

5
  • Applications
  • Application areas of e-beam lithography span a
    wide range from cryo-electric devices,
    opto-electronic devices, quantum structures,
    transport mechanism studies of semiconductor/super
    conductor interfaces, microsystem techniques,
    optical devices.
  • The use of electron-beam lithography on pentacene
    and poly(3-hexylthiophene) field-effect
    transistor to achieve device isolation and enable
    the realization of nanoscale organic circuits.
  • Can be used in the fabrication process by soft
    lithography.

6
Soft Lithography
  • Soft lithography uses an elastomeric mold to
    shape soft materials.
  • This technique has been recently developed as a
    tool for micro- and nano-fabrication
    (optoelectronic components)

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