Electron Beam

1
Electron Beam Lithography and Nanofabrication
Exposure
Electron Beam
High MM PMMA Low MM PMMA Indium Tin Oxide Glass
Bilayer e-beam resist structure. A high molecular
weight PMMA is spun on top of a slightly more
sensitive bottom layer of low melecular weight
PMMA.
Development
Metal deposition
Liftoff
The resist is developed in MIBKIPA giving an
undercut.
The resist is removed in a liquid solvent leaving
the pattern.