Random Number Generator - PowerPoint PPT Presentation

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Random Number Generator

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Introduction of Resolution Enhancement Techniques to aid lithography ... 'Layout Optimization at the Pinnacle of Optical Lithography', L. Liebmann et al. SPIE 2003. ... – PowerPoint PPT presentation

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Title: Random Number Generator


1
Random Number Generator
  • Dimtriy Solmonov W1-1
  • David Levitt W1-2
  • Jesse Guss W1-3
  • Sirisha Pillalamarri W1-4
  • Matt Russo W1-5
  • Design Manager Thiago Hersan

2
Agenda
  • Overview of project
  • Status
  • Decisions
  • Signal flow on Floor Plan
  • Critical Path
  • Schematic Screen Shots

3
A Quick Review
  • Applications encryption, gambling, personal
    computers, etc.
  • Goal faster random number generation than
    current software.
  • Algorithm
  • 1028 bit seed fed into RAM
  • Feedback loop repeats 256 times to hash the seed
    and produce a pseudorandom number.
  • Two stage, five clocks per stage pipeline.

4
Status
  • Last Time
  • C implementation
  • Architecture
  • Behavioral Verilog Datapath design
  • Finished Simulation
  • Gate-Level Design
  • Preliminary Floorplan
  • In Process
  • Schematic (mostly done)
  • Layout (gates)
  • Unfinished
  • Extraction, LVS, post-layout simulation

5
Design Decisions
  • No sense amps

6
Layout Decisions
  • Lithography resolution enhancement
  • As transistors become small
  • More regular layout, layout rules
  • Metal Direction

7
What does it mean?
  • Increasing problems with printability
  • Optical wavelengths are smaller than critical
    distances
  • Introduction of Resolution Enhancement Techniques
    to aid lithography
  • Optical Proximity Correction modifies layout to
    improve printing

sources 18-322 Lecture 27, Fall 2003
8
Regularity-Based Restrictive Design Rules
  • Having layout that adheres to more strict design
    rules are becoming necessary for modern printing
    techniques
  • Want to keep each layer as simple as possible
  • Current research at CMU proposes
    regularity-driven layout
  • Layout Optimization at the Pinnacle of Optical
    Lithography, L. Liebmann et al. SPIE 2003.
  • Design Methodology for IC Manufacturability
    Based on Regular Logic-Bricks, V. Kheterpal et
    al. DAC, 2005.

9
How does it affect us?
  • Restrictive design rules include
  • Single orientation and fixed pitch for critical
    lines (poly, M1, M2)
  • Metal Layers
  • Vertical Poly, M1, M3
  • Horizontal M2, M4
  • Contacts and vias are also on a grid
  • Work with Thiago to define rules
  • Implications
  • Cons
  • Probably bigger area (lower density)
  • Need for extra metal layer
  • Pros The way of the future

10
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11
typedef unsigned int u4 / unsigned four bytes,
32 bits / define ALPHA (8) define SIZE
(1ltltALPHA) define ind(x) ((x)(SIZE-1))
define barrel(a) (((a)ltlt19)((a)gtgt13)) /
beta32,shift19 / static void ibaa(m,r,aa,bb)
u4 m / Memory array of SIZE ALPHA-bit terms
/ u4 r / Results the sequence, same size as
m / u4 aa / Accumulator a single value /
u4 bb / the previous result / register
u4 a,b,x,y,i a aa b bb for (i0
iltSIZE i) x mi a barrel(a)
mind(i(SIZE/2)) / set a / mi y
mind(x) a b / set m / ri b
mind(ygtgtALPHA) x / set r / bb b
aa a
12
Signal Flow on Floor Plan
725 um²
13
Critical Path
  • FSM
  • Runs at .55 n
  • Adder
  • Runs at .6 n (critical 13 bits)
  • SRAM
  • lt .5 n

14
SRAM Schematic
15
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16
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17
Adder Schematics 3-Bit Generate
18
Adder Schematics 3 Bit Propagate
19
Adder Schematics 3 Bit CS Adder
20
Quick Bibliography
  • Techniques for Fast CMOS-based Conditional Sum
    Adders
  • Hands Lindkvist and Per Andersson
  • High Efficient 3-input XOR for Low-Voltage
    Low-Power High-Speed Applications
  • Kuo-Hsing Cheng and Ven-Chieh Hsieh
  • Carry-Look-Ahead and Ling Adders
  • Stanford University
  • L. W. Liebmann (slides)
  • IBM

21
Thanks! Any Questions?
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