Nanolithography using DI Nanolithography Software for Explorer

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Nanolithography using DI Nanolithography Software
for Explorer

• PMMA C6 spun at 4000 RPM onto a Si(100)
  Substrate thickness 200 nm
• Baked at 115oC for 30 seconds
• Pattern scratched onto surface
• Previously used NSC A tip did the actual writing
• T-B -5 nA, Setpoint 5 nA
• With feedback off, a relative z offset of 100 nm
  was added to the z scanner to move the tip closer
  to the surface
• Write speed was 1mm/s

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Nanolithography OU Symbol
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Nanolithography OU Symbol - Zoom in
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Nanolithography OU Symbol - Line Scan
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Nanolithography OU Symbol - 3D View
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Nanolithography Luke -first write
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Nanolithography Vertical and Horizontal lines
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Nanolithography Tip image Before and After