Characterising the Stress of Thin Films and Membranes

1
Characterising the Stress of Thin Films and
Membranes

• Significant effort has been put into
  characterising the stress of thin nitride, poly,
  and LTO films.
• Effort has been put into reducing the stress of
  the resulting films using different doping
  techniques.
• We are also currenlty designing test structures
  that quantitatively determine the stress of thin
  membranes.
• These results will be used to improve the
  performance of Capacitive Ultrasonic Trasducers
  (cMUTs).

Figure An example of a ring that will make up
part of the test structure to determine the
stress of thin membranes.
Users E. Wong, M. Badi, G. Yaralioglu, S. Ergun
Stanford Univeristy Principal Investigator B.T.
Khuri-Yakub Stanford University NNUN Site
Stanford University