Scheme for voltage, current and nanoparticle density measurements in silane radio-frequency plasma.

1
Scheme for voltage, current and nanoparticle
density measurements in silane radio-frequency
plasma.
M. Sorokine, H. Hemmen, W.W. Stoffels, G.M.W.
Kroesen
Department of Physics, Eindhoven University of
Technology, P.O. Box 513, 5600 MB Eindhoven, The
Netherlands
Plasma discharges are widely used in many
specialized commercial production environments.
One of these is the production of solar cells.
The key process in that production is the plasma
enhanced silicon layers deposition. Solar cells
are known to have a high cost and a poor
efficiency. By incorporating nano-scale particles
into the layers, a considerable improvement in
product quality is achieved. This work is devoted
to a study of the process of nano-particle
formation.
Relative errors.
FFT. 0.2 fund. 60 harm.
Two promising techniques are to be applied here.
Using a microwave resonance technique, we are now
able to measure average electron density in a
plasma chamber. However, measurements of voltage
and current by means of a Scientific Systems
voltage/current sensor have encountered several
difficulties, part of which can be attributed to
the very low amplitudes of higher harmonics in
the acquired signal.
Electron density
Phase shift. FFT 270. PIM 850.
FFT spectrum.