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Life is CMOS: Why Chase the Life After

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Pollack's Rule. 31. Design Efficiency mArch. In the same process technology, compare: ... Pollack's Rule in action Power inefficiency. Improve mArch Efficiency ... – PowerPoint PPT presentation

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Title: Life is CMOS: Why Chase the Life After


1
Life is CMOSWhy Chase the Life After?
  • George Sery
  • Shekhar Borkar
  • Vivek De
  • Intel Corporation


2
Outline
  • Integration, performance, and power
  • Device technology scaling challenges
  • Leakage and leakage control techniques
  • Micro architecture directions
  • Summary

3
Transistors
1B transistor integration capability
4
Frequency
5
Performance
Applications will demand TIPS performance
6
Power Dissipation
Unconstrained power could reach 1,000s of watts
7
Outline
  • Integration, performance, and power
  • Device technology scaling challenges
  • Leakage and leakage control techniques
  • Micro architecture directions
  • Summary

8
Physical Gate Length Trend
8
Facilitated by 248, 193, 157, EUV lithography
evolution
9
Supply Voltage Scaling
2.5V
1.8V
1.5V
1.3V
1.1V
0.85V
0.7V
0.6V
9
10
Delay Scaling Trends
1.45 Tera Hertz
0.85V
Vcc0.75V
10
11
15nm NMOS Transistor
2.63 THz _at_ 0.8V
11
12
Source/Drain Leakage (Ioff)
13
Gate Leakage
40 DVgs ? 5X IG
14
THz Transistor Architecture
High K gate
Fully Depleted Channel
Raised S/D
  • Eliminates subsurface leakage
  • Solves high resistance
  • Minimizes gate leakage
  • Eliminates floating body effect
  • Minimizes soft error rates
  • 50 lower junction capacitance that PD SOI

14
15
Raised SD with Depleted Substrate
15
16
High K Reduces Gate Leakage
1E1
1E0
TiO2
1E-1
HfO2
)
2
1E-2
Ta2O5
ZrO2
SiO2
1E-3
_at_1V (A/cm
1E-4
OX
1E-5
J
Al2O3
1E-6
1E-7
1E-8
16
0.50
1.00
1.50
2.00
2.50
3.00
3.50
2
C
(
m
F/cm
)
ox
17
High-K Gate Dielectric Formed Using Atomic Layer
Deposition
Step 4
  • Sequential introduction of precursors ZrCl4(g),
    H2O(g)
  • Surface reaction between substrate each
    precursor until saturation

17
18
DST Outperforms PD SOI
Ideal
  • DST achieves steeper sub-threshold slope and
    lower Ioff than both PD SOI and bulk Si
  • Up to 100x lower leakage than partially
    depleted SOI

18
19
Raised Source and Drain Reduces Parasitic
Resistances and Improves IDSAT
1.3V
Raised S/D
1.3V
No Raised S/D
19
30 increase in drive current!
30 increase in drive current!
20
DST Enables Future Voltage Scaling
DST
BULK CMOS
20
21
Outline
  • Integration, performance, and power
  • Device technology scaling challenges
  • Leakage and leakage control techniques
  • Micro architecture directions
  • Summary

22
Leakage Power
Excessive sub-threshold leakage power
23
Dual VT Design Technique
Leakage 3X smaller (Active Standby) No
performance loss
24
Leakage Control
Stack Effect
Body Bias
Sleep Transistor
Vbp
Vdd
Ve
Logic Block
Equal Loading
Vbn
-Ve
2-10X reduction
2-1000X reduction
25
Effectiveness of RBB
RBB less effective at shorter L and lower VT
A. Keshavarzi et. al., 1999 2001
International Symp. Low Power Electronics
Design (ISLPED)
26
SD Leakage of Stacks
Stack leakage is 5-10X smaller
S. Narendra et. al., 2001 International Symp.
Low Power Electronics Design (ISLPED)
27
Stack Forcing
Delay Penalty
Leakage Reduction
Equal Loading
Stack Forcing Vs Longer L
Circuit technique provides additional VTs
28
Exploiting Natural Stacks
32-bit Kogge-Stone adder
Y. Ye et. al., 1998 Symp. VLSI Circuits
29
Outline
  • Integration, performance, and power
  • Device technology scaling challenges
  • Leakage and leakage control techniques
  • Micro architecture directions
  • Summary

30
Performance Efficiency of mArch
  • Implications (in the same technology)
  • New microarchitecture 2-3X die area of the last
    uArch
  • Provides 1.5-1.7X performance of the last uArch

We are on the wrong side of a Square Law
31
Design EfficiencymArch
In the same process technology, compare Scalar ?
Super-scalar ? Dynamic ?
Netburst 2-3X Growth in area 1.4X Growth in
Integer Performance 1.7X Growth in Total
Performance 2-2.5X Growth in Power
Pollacks Rule in actionPower inefficiency
32
Improve mArch Efficiency
Thermals Power Delivery designed for full HW
utilization
Single Thread
ST
Wait for Mem
Multi-Threading
Wait for Mem
MT1
Wait
MT2
MT3
Multi-threading improves performance without
impacting thermals power delivery
33
Special-Purpose HW
  • Special-purpose performance ? more MIPS/mm²
  • SIMD integer and FP instructions in several ISAs
  • Integration of other platform components, e.g.
    memory controller, graphics
  • Special-purpose logic, programmable logic, and
    separately programmable engines

Improve power efficiency with Valued Performance
34
Exploit MemoryLow PD
  • Large on die caches provide
  • Increased Data Bandwidth Reduced Latency
  • Hence, higher performance for much lower power

35
Summary
  • CMOS scaling is alive and well
  • Lower power, Terahertz operation, Scalable beyond
    65nm node
  • Key enabling elements demonstrated
  • Depleted Substrate Transistor with raised source
    drain
  • High k gate, 15nm CMOS gate length
  • Design, micro architecture approaches continue
    key enabling
  • Significant focus on leakage and speed-power
    optimization techniques
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