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SiGe Nanomembrane and Nanotube

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Title: SiGe Nanomembrane and Nanotube


1
Si/Ge Nanomembrane and Nanotube J. Zang and Feng
Liu 1Department of Materials Science and
Engineering, University of Utah, Salt Lake City,
UT 84121
Mechanical bending of thin films is a
ubiquitous phenomenon impacting on our daily life
through household thermostat to advanced
microelectromechanical systems (MEMS). With the
emergence of nanotechnology, the thin-film
bending mechanism has been widely exploited in
nanoscale MEMS devices and sensors, as well as in
flexible electronics and mechanochemical sensors.
Another innovative use of the thin-film bending
mechanism has been demonstrated for fabricating
nanostructures, such as nanotubes and nanocoils,
through so-called nanomechanical architecture
of strained bilayer films 1. This novel
nanofabrication approach has several important
technological advantages. It is completely
compatible with the Si technology, employing the
industrial viable thin-film processing of growth,
patterning, and lift-off (e.g., by etching). It
is extremely versatile, applicable to most
materials combinations, including semiconductors,
metals, insulators, and polymers. It also allows
fabrication of different types of nanostructures,
with a high level of control over their size and
shape based on a priori theoretical designs.
However, there exist some fundamental limitations
on the current application of the approach. So
far, all the nanostructures are strictly made
from bilayer or multilayer films, because misfit
strain is employed as the only driving force for
bending. The nanostructures, such as nanotubes,
so made must have a fixed configuration with the
tensile film (such as Si) as the inner layer and
the compressive film (such as Ge) asthe outer
layer, as predefined by the lattice mismatch
between the two constituting layer materials
(such as Si and Ge).
2
Recently, we have discovered a self-bending
mechanism of nanofilms (nanomembranes) that will
overcome these limitations 2. We demonstrate
that ultrathin Si and Ge nanofilms may self-bend
without external stress load, under its own
intrinsic surface stress imbalance arising from
surface reconstruction. This leads to
self-rolled-up pure Si and Ge nanotubes (see Fig.
1a), extending the nanomechanical architecture to
single films of one material, without the need
for deposition of a second strained layer. Under
the same mechanism, SiGe bilayer nanofilms may
bend toward the Ge side, opposite to what defined
by misfit strain, allowing formation of SiGe
nanotubes in an unusual configuration with Ge as
the inner layer (see Figs. 1b and 1c). Such
rolled-up nanotubes are found to accommodate very
high strains, even beyond the misfit strain
defined by lattice mismatch (i.e., larger than
4 between Si and Ge), which in turn induce
large variations of electronic and optoelectronic
properties.

Fig. 1. MD simulated nanotubes. (a) A Si nanotube
formed by self-bending of a 5-layer Si beam. (b)
A SiGe nanotube with Si as the inner layer formed
by bending of a 5-layer SiGe beam. (c) A GeSi
nanotube with Si as the inner layer formed by
bending of a 5-layer GeSi beam.
1 Nanomechanical Architecture of Strained
Bilayer Thin Films from design principles to
experimental fabrication, Minghuang Huang, C.
Boone, M. Roberts, D. E. Savage, M. G. Lagally,
N. Shaji, H. Qin, R. Blick, J. A. Nairn and Feng
Liu, Adv. Mater. 17, 2860 (2005). 2 Nanotube
Formation from Self-Bending Nanofilms Driven by
Atomic-scale Surface Stress Imbalance, Ji Zang,
Minghuang Huang and Feng Liu, Phys. Rev. Lett.
98, 146102 (2007).
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