Ar -induced sputtering yield of graphite target - PowerPoint PPT Presentation
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Ar -induced sputtering yield of graphite target
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Ar -induced sputtering yield of graphite target (Cont'd) ... Discharge gas: Argon; Y: Sputtering yield; Jion: Ion impinging flux; t: Deposition time ... – PowerPoint PPT presentation
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Title: Ar -induced sputtering yield of graphite target
1
Ar-induced sputtering yield of graphite target
Discharge gas Argon Substrate biased voltage
-200 V Working pressure 3.0mTorr
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Ar-induced sputtering yield of graphite target
(Contd)
Discharge gas Argon Forwarded RF power 750 W
Working pressure 3.0mTorr
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YJiont dependence of film thickness
Discharge gas Argon Y Sputtering yield Jion
Ion impinging flux t Deposition time
