Modeling for the RealTime Control of Thin Films

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Modeling for the Real-Time Control of Thin Films
Joselyn Torres Torres Dr. Manuel Toledo
Quiñones Electrical and Computer
Engineering Department UPR-Mayagüez

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What is CVD ?

• Chemical-Vapor Deposition (CVD) consists on the
  reaction of gaseous compounds on the surface of a
  substrate to produce a solid film and volatile
  byproducts.

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What is CVD? Cont.
A CVD System
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What is CVD?,cont.
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CVD Applications

• Deposition of protective coatings
• Fabrication of electronic devices
• Production of optical coatings

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Motivation
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Research Objective

• Develop a generic lumped model to capture the
  dominant dynamic and steady-state
  characteristics of CVD

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CVD Model

• The dominant system dynamics of the thermal/fluid
  aspects of the equipment and the process physics
  are captured.

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CVD Model
Fluid Dynamics
Diffusion in the boundary layer
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CVD Model
Surface reactant concentration
Surface byproduct concentration
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CVD Model

• The rate of Deposition is given by

kr reaction rate
qT concentration of surface sites
XA the surface fractional coverage of
reactant particles
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Model Dynamics
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Results
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Conclusion

• Our CVD model can describe the behavior of the
  deposition rate in thin films.

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Future Studies

• Include more reactant gases in the CVD model.
• Use a genetic algorithm that will help us to do
  fitting.
• Feedback control implications.

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Acknowledgements

• IAP
• RamÓn Mercado