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Jerry L' Hudgins

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No current flow in its off-state (forward or reverse blocking) ... Breakdown voltage limits are imposed (forward and reverse blocking) ... – PowerPoint PPT presentation

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Title: Jerry L' Hudgins


1
Semiconductor Modeling and Simulation
  • Jerry L. Hudgins
  • University of South Carolina

Enrico Santi University of South Carolina
Patrick R. Palmer University of Cambridge
2
Technology Areas
  • Device Characterization, Modeling, and Simulation
  • Semiconductor Material Systems and
    Temperature-Dependent Physical Behavior to
    support modeling

3
Model Levels
  • 5 Levels of Models, 0 to 4.
  • Modified from System Proposed by Budihardjo ,
    Lauritzen, Wong, Darling, and Mantooth.
  • Focus on Development of Level-1, Level-2, and
    Level-3 Semiconductor Device Models.

4
Level-0 Models
  • No distinction of device type only ideal-like
    switch.
  • No current flow in its off-state (forward or
    reverse blocking).
  • No voltage drop in its on-state (forward
    conduction state).
  • Maximum blocking voltage and conduction current
    limits can be set.
  • No junction-temperature information.
  • No power loss information.

5
Level-4 Models
  • All relevant physical behavior captured in this
    model.
  • Model is 3- or 4-dimensional in space-time.
  • Model is process dependent.
  • Model maps charge flow, electric fields, and
    thermal gradients.
  • No analytical description available so must use
    finite-element methods.

6
Level-4 Model Examples
Heat flux and thermal gradients in a DBC module
Charge distribution in a NPT IGBT
7
VTB Level-1 Models
  • Forward conduction current as a function of
    forward voltage drop and temperature (this allows
    estimation of forward conduction losses).
  • Off-state (forward blocking) leakage current
    included.
  • Turn-on switching losses a function of blocking
    voltage and temperature.
  • Turn-off switching losses a function of
    conduction current and temperature.

8
VTB Level-1 Models
  • No gating or triggering losses are calculated.
  • Breakdown voltage limits are imposed (forward and
    reverse blocking).
  • Maximum forward conduction-current limit is
    imposed.
  • Maximum junction-temperature limit is imposed.
  • Simple multi-section RC equivalent network
    included for junction temperature calculation.

9
Example of Level-1 Model IGCT
  • VDRM 4500 V (repetitive peak off-state voltage)
  • ITAVM 1700 A (maximum average on-state current
    half sine wave)
  • ITRMS 2700 A (maximum rms on-state current)

10
Test Circuit
  • The Level-1 Model of the IGCT tested under the
    following conditions
  • High current
  • Frequency 1000Hz

11
Electrical and Thermal Waveforms
12
VTB Level-2 Models
  • 1-Dimensional in Space.
  • Simplified Physical Description.
  • Simple Thermal Effects on Carrier Motion
    Included.
  • Uses Modified and Extended Lumped-Charge
    Technique first Developed by Ma, Lauritzen, et.al.

13
Example of Level-2 Model
  • IGCT

14
VTB Level-3 Models
  • All models are quasi-2D.
  • All models solve the 1-D carrier diffusion
    equation at each point in space and time.

15
Level-3 Model Attributes
  • Based on Fourier Solution Initially Proposed by
    Leturcq and Further Expanded by Santi, Palmer,
    and Hudgins.
  • All Level-3 models include temperature dependent
    effects, and are valid for junction temperatures
    from 150 to 150 oC.
  • Bandgap Energy
  • Density-of-States Effective Mass
  • Carrier Mobilities
  • Ionized Impurity Concentration
  • Carrier Lifetimes

16
IGBT Level-3 Model in SIMULINK
MOSFET conduction
IGBT
Base resistance
Miller capacitance
Carrier storage region
Depletion layer
Gate circuit
17
IGBT Level-3 Models Developed
  • IGBTs
  • Non-Punch Through, NPT
  • Planar-Gate Structure

18
IGBT Models
  • Punch-through (PT), planar- and trench-gate.
  • High-Voltage and Field-Stop Designs

19
Model Validation
  • Experiment
  • Atlas finite element simulation
  • Physics-based model
  • Atlas and the model allow us to look at the
    physics inside the device

20
Atlas Simulation vs Experiment
VGE
IC
VCE
21
Level-3 Model vs Experiment
VGE
IC
VCE
22
Charge Profile Atlas
3.0?s
3.5?s
4.3?s
2.8?s
2.0?s
8.0?s
2.7?s
23
Charge Profile Model
3.5?s
4.3?s
3.0?s
2.8?s
2.0?s
2.7?s
8.0?s
24
Examples of NPT-IGBT Simulations
NPT-IGBT at 100 oC. Comparison between the
experimental result (dark blue-current
pink-voltage) and simulation (yellow- current
light blue- voltage) during turn-off.
NPT-IGBT at -125 oC. Comparison between the
experimental result (dark blue-current
pink-voltage) and simulation (yellow- current
light blue- voltage) during turn-off.
25
Examples of PT-IGBT Simulations
PT-IGBT at room temperature. Comparison between
the experimental result (dark blue-current
pink-voltage) and simulation (yellow- current
light blue- voltage) during turn-off.
PT-IGBT at 100 oC. Comparison between the
experimental result (dark blue-current
pink-voltage) and simulation (yellow- current
light blue- voltage) during turn-off.
26
Model Validation Turn On Losses
Energy J
Temperature C
27
Model Validation Turn Off Losses
Energy J
Temperature C
28
Diode Level-3 Models
Diodes B and A at room temperature. Comparison
between the experimental result (dark
blue-voltage pink-current) and simulation
(yellow-voltage light blue-current) during
turn-off.
29
Two-Step Parameter Extraction Procedure
  • Step 1 practical parameter extraction Only one
    clamped inductive switching experiment needed
  • Step 2 automated optimization procedure

30
Step 1 IGBT Parameters
Only one inductive switching experiment
31
Step 2 Parameter Optimization
Automated procedure
32
Semiconductor Properties and Material Systems
33
Fundamental Semiconductor Physics for Cryogenic
Operation
for T 170 K for T gt 170 K
Included Accurate Description of Bandgap Energy
as a Function ofTemperature.
Temperature dependence of the bandgap energy in
silicon.
34
Fundamental Semiconductor Physics for Cryogenic
Operation
Improved Effective MassRelationships (Hole).
Electron
__ Equation (3) - - Equation, Ref. 16
Data, Ref. 13
__ Equation (4) - - Equation, Ref. 16
Data, Ref. 13
Hole
35
Cryogenic Operation
Developed New Description forIonized Donors for
Tlt77 K.
Developed New Description for Electron and Hole
Mobilities for Tlt77 K.
Electron Mobility (cm2/Vs)
Ionized donor concentration as a function of
temperature. The background doping density is
assumed to be 1014 cm-3 and phosphorous as the
dopant species.
Electron mobility as a function of temperature
for T lt 300 K.
36
Cryogenic Operation
Improved Lifetime ExpressionIncludes SRH and
Auger Recombination.
37
Semiconductor Materials
  • Compared Thermal Conductivity, CTE, Mobility, and
    Bandgap

38
Critical Field as a Function of Energy Bandgap
Direct Gap Ec 1.73?105 (EG)2.5
Indirect Gap Ec 2.38?105 (EG)2
Equation (SzeGibbons)
39
Semiconductors with Good Thermo-Mechanical
Properties
Semiconductors with CTE between 4 and 6 ppm/K. C
and BN included because of high thermal
conductivity.
Semiconductors with thermal conductivity above
100 W/mK.
40
Thermo-Mechanical Best
  • The reduced list of semiconductors to achieve
    high thermal conductivity as well as match the
    CTE of common package substrate materials
    becomes GaN, AlN, GaP, SiC (6H), SiC (4H)
  • C (Diamond) and BN (Cubic) are included as the
    very high thermal conductivity implies very small
    temperature rise so the relatively low CTE may
    not be so important for these materials.

41
Electron Mobility vs. Bandgap Energy
  • Semiconductors with electron mobilities above 700
    cm2/Vs and with a bandgap energy above 1 eV
    are InP, GaAs, InN, GaN, AlN, Si, SiC (3C), SiC
    (4H), and C.

42
Thermo-Mechanical-Electrical Selection
  • The semiconductors with the best electrical and
    thermo-mechanical characteristics are now reduced
    to C, GaN, AlN, and SiC (4H).

43
GaN Devices
  • Breakthrough in GaN Transistor Development
  • High Density 2D Electron Gas at AlGaN/GaN
    Interface as high as 2 x 1013 cm-2
  • The screening of defects and impurities by the 2D
    gas causes the effective electron mobility to
    increase to 1500-2000 cm2/Vs

44
GaN Hetero-Junction Field-Effect Transistors
(Simin, Khan)
  • MOSHFET
  • HFET

GaN 2 mm, Si-doped (1018-1019 cm-3) Al0.2Ga0.8N
30 nm S-D spacing of 2-16 mm, L0.1-1 mm,
W50-100 mm
45
I-V Characteristics of MOSHFET
VDS 8.1 V _at_VGS6 V, JD15 A/mm2, and 300 K
46
Summary Here Today, Gone Tomorrow
I wouldnt worry about those little fuzzy guys.
Si
Si
C
GaN
Si
SiC
47
Electrical Equivalent Model
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