Sources and Beam Lines of Canadian Light Source

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Sources and Beam Lines of Canadian Light Source
Emil Hallin Canadian Light Source (material
organized and presented by D.T. Jiang)
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First Phase CLS Beamlines

• 7 beam lines are funded and approved by the
• CLS Facility Advisory Committee
• (Facility Diagnostic Line 1 BM, visible light)
• Far IR (BM)
• Mid IR Spectromicroscopy (BM)
• Soft X-ray Spectromicroscopy (Elliptical
  Undulator)
• SGM (Undulator)
• VLS-PGM (Undulator)
• Protein Crystallography (Small Gap in-vacuum U)
• Hard X-ray microXAFS (Wiggler, Ec10.7keV)

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Main Hall Floor plan
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Mezzanine Level
Expansion Zone - Beamlines
Offices Labs
Office Reserve
Lab Reserve
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High Resolution Far IR Spectroscopy

• PI Bob McKellar Robert.Mckellar_at_nrc.ca
• Wavelength range 10-200 mm, 0.006-0.13 eV,
  50-1000 cm-1
• Resolution lt 0.001 cm-1
• Endstation
• High resolution Fourier Transform spectrometer
• Sensitive FIR detectors liquid He cooled
• Gas Phase work
• Coolable long-path cell
• Multi-pass electric discharge cell
• High temperature absorption cell
• Supersonic jet expansion chamber
• High pressure diamond anvil cell, focusing
  optics, bench alignment tools
• Surface interface studies UHV chamber, sample
  preparation and manipulation, 100 mm spot size

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Mid IR Spectromicroscopy

• Mike Jackson mike.jackson_at_nrc.ca
• Wavelength 1.5-15 mm, 0.08-0.8 eV, 700-6000 cm-1
• Spatial resolution lt 5 mm

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IR Beamlines
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First Mirror Concept
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02B1.1 Mid IR Schematic
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02B1.1 Mid IR Floor Layout
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01B1.1 Far IR Schematic
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01B1.1 Far IR Floor Layout
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Brightness 100 mA
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Soft X-ray Spectromicroscopy

• PI Adam Hitchcock aph_at_mcmaster.ca
• Wavelength 6-60 Angstrom, 250-1900 eV
• Insertion device EPU (AppleII, ESRF termination)
• Infinity corrected entrance slitless PGM with
  vertical dispersion plane
• Optics grating (SX700 style) zone plate
• Resolution 3000 or better
• Endstation STXM PEEM

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SM Optical Layout
Feature XES
177o
M1
6o
PGM
177o
M2 G(1-3)
exit slit
M3 STXM
16.2 (15.0)
1.5
EPU
6
3
5
STXM
1.5
M3 PEEM
6o
3
exit slit
M4 PEEM
3
177o
1
PEEM
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SM Optical Description

• Variable polarization arbitrary linear
  150-2000eV, circular- 100-1000eV
• Infinity corrected PGM STXM at long arm branch
  (preserved brightness),
• PEEM (exchangeable) on short (preserve flux)
• Nominal energy resolving power 3000, may be
  increased till 7000
• Intensity on sample STXM-108ph/s at 40nm,
  PEEM-1012ph/s in f40m
• Stable operation even for CLS 2005 e-beam
  parameters

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SGM and VLS PGM

• PI T.K. Sham sham_at_uwo.ca
• SGM Wavelengths 200 1900 eV
• PGM Wavelengths 5.5 250 eV
• SGM Resolution 3000
• PGM Resolution 10000
• Optics grating monochromator
• Endstations UHV
• Capabilities photoemission, XAFS
• Both preliminary design reports are complete

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Insertion Devices

• SGM- 44 mm PPM device 1.2 m long
• PGM- 185 mm PPM device 1.8 m long 
• 1.25 mrad total canting between devices 
• Preliminary designs for both devices complete

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Protein Crystallography

• PI Louis Delbaere Louis.Delbaere_at_usask.ca
• Wavelengths 1.9 0.68 Angstrom, 6.5 18 keV
• Resolution 1.6 x 104 using Si(220)
• Typical Crystal size 20 50 mm
• Design goal flux of 1013 photons/sec into a 50 x
  100 mm area
• Design will be modeled after beamlines at SBC-CAT
  and SER-CAT (APS). Preliminary design is almost
  complete.

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Protein Crystallography Beamline Layout
(Based on the Design of SER-CAT/APS)
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Small Gap Undulator Brilliance
Per 4.5 cm, N26 (L1.19m), B00.843T, Kmax3.54
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Micro-XAFS
PI De-Tong Jiang jiang_at_usask.ca
Superconducting Wiggler Parameters lm 0.033
m Magnet Period Length N 35.5 Number of
Periods B 1.9 T Magnetic Field K 5.91 K
Parameter   Front End Aperture 1 mrad (H) x
0.24 mrad (V)   Ray-tracing shows that the XAFS
focus is 1050 m horizontal (FWHM) x 257 m
vertical (FWHM) in size. The Kirkpatrick-Baez
mirror pair reduces this down to 14-19 m
horizontal (FWHM) x 6-9 m vertical (FWHM),
using bent elliptical cylinders.  
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Wiggler Brilliance
DTJ Note This is from the first hybrid design
concept, total power SR there would have been 23
kW. Gave up and switched to Superconducting
design. The new design is at least another
factor of 2 better yet half the total SR power.
Smaller SR horizontal fan of course.
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Flux at Sample (Shadow tracing)
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Micro-XAFS photon flux
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Summary of CLS BL Status

• First 7 lines scheduled operation time Jan. 2004
• Preliminary designs for most of the first 7 lines
  are complete
• Tendering process has been started on beamline
  and endstation
• Instrumentation
• Phase I Insertion device preliminary designs are
  completed
• Front ends conceptual design completed

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CLS Design Parameters
Circumference m 170.88
Periodicity 12
Optics nx (tune) ny cx (natural chromaticity) cy Momentum compaction 10.22 3.26 -13.9 -17.7 0.0038
Straights center center Number Length bx (betatron) by d (dispersion) m m m m 12 5.2 8.5 4.6 0.15
RF Frequency Total voltage MHz MV 500 2.5
E (energy) GeV 2.9
Bdipole T 1.354
Damping times tx ty tz ms ms ms 2.4 3.8 2.7
E-loss/turn MeV 0.876
Dipoles Total Rad. SR Power kW_at_500mA 438
Dipoles Rad. SR Power per meter kW/m 9.76
ex (emittance) nm-rad 17.8
d (energy spread) 0.11
Bunch length (full) ps 54
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CLS Reference Specifications
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CLS Source Point Sizes and Machine Functions
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Bending Magnet Brilliance
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Bending Magnet Total Flux
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Wiggler Total Flux
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Small Gap Undulator Flux
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Cell 6 Block diagram layout

• Cell 6 includes the following beamlines, none of
  which are as yet approved
• Hard X-ray Microprobe
• Powder diffraction
• CSRF DCM replacement

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Cell 6 Elevation concept layout
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Cell 7 Block diagram layout
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Cell 7 Elevation concept (XAFS Center line)
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Cell 7 Elevation concept (Sidestation)
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FLUX 100 mA
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SM AutoCAD layout

• EPU (conceptual design is issued, no significant
  influence on machine)
• Front End (Duplex, conceptual design is issued)
• Following ALS co-development M1 mirror
  (Glidcop), PGM, Mirror manipulator for M1-M4
  eng. drawings and part order spec. Vacuum
  chambers and supports for mirrors need to be
  designed.
• PEEM (ordered, summer 2002), STXM (engineering
  design due to April 02)
• Exit slits, vacuum equipment, electronics,
  maintenance/ commissioning equipment- commercial

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Heat load estimation for CSRF SGM at the CLS
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Progress Report (11B1.1) Medium Energy X-ray
Facility Beamline (DCM)

• Updated Calculations
  1. Photon flux curves
  2. Resolution curves
  InSb(111),Si(111) 3.
  Resolution from SHADOW
• Design specification has been written
  Engineering Request for Finite Element Analysis
  (FEA)/Design of Double Crystal Monochromator
  beamline crystal cages
  Submitted to CLS
  Engineering (Dan Lowe).
  Possible Outsourcing
  1. Instrument
  Design Technology 2. Physical
  Sciences Laboratory 3. Advanced
  Design Consulting, Inc. 4. Oxford Danfysik
• Preliminary design report is still being written.
  
  October, 2001? Overlap with Lijun Lu

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Photon Flux on sample
The theoretical photon flux (photons/second) on
sample for a 500 mA beam at the Canadian Light
Source in 2008. InSb(111) crystals were used in
the calculation from 1750-3700 eV, while Si(111)
crystals were used above this photon energy.
Below 2100 eV the harmonic filter mirror (M5)
was in place, while above this photon energy it
was assumed to be moved out. The two curves
illustrate the expected photon flux on sample
for the conditions of the carbon filter being
in place, then out.
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Theoretical resolution (FWHM) and
s-polarization peak reflectivity for Si(111)
and InSb(111) crystals
The theoretical DCM resolution (FWHM) and
s-polarization peak reflectivity for Si(111)
and InSb(111) crystals in parallel orientation
(,-) versus photon energy. The calculated
resolutions and reflectivities are based on the
combination of both crystals in this
configuration.
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Comparison of resolution at the experimental
focus SHADOW versus XCrystal (XOP)
Comparison of the resolution at the experimental
focus calculated by SHADOW using a continuous
photon energy input, with that from XCrystal
(XOP), for 1840 eV. InSb(111) crystals were
used in parallel orientation (,-) for the
calculations.
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Protein Crystallography Endstation