Silicon Optical Modulators - PowerPoint PPT Presentation

1 / 12
About This Presentation
Title:

Silicon Optical Modulators

Description:

Silicon Optical Modulators Recent developments in fabrication of High Speed Modulators J ee290f Outline Motivation Png, Reed, et al. work from Surrey. – PowerPoint PPT presentation

Number of Views:92
Avg rating:3.0/5.0
Slides: 13
Provided by: jpro5
Category:

less

Transcript and Presenter's Notes

Title: Silicon Optical Modulators


1
Silicon Optical Modulators
  • Recent developments in fabrication of High Speed
    Modulators
  • J
  • ee290f

2
Outline
  • Motivation
  • Png, Reed, et al. work from Surrey.
  • Shows basic principle and gives one of the two
    major design types
  • Intel device
  • History making device, designed and fabricated in
    alternate major design type.
  • Conclusions

3
Motivation
  • Very clear Si modulators means CMOS integration
    and using all our experience in silicon
    micromachining.
  • Unfortunately, prior to 2003 the fastest Si
    optical modulator was 20MHz (Lithium Niobate
    modulators are 10GHz).

4
p-i-n Si Optical Modulators 1/4
  • Follows the work presented by Png, Reed, et al
    from Surrey University (UK).

5
p-i-n Si Optical Modulators 2/4
VD is applied to Anode vs. Cathode. ? forward
biased p-i-n junction. ? e and holes injected
into guiding region ? changes refractive index
6
p-i-n Si Optical Modulators 3/4
?n ?ne ?nh -8.8 x 10-22(?Ne) 8.5 x
10-18(?Nh)0.8 ?? ??e ??h 8.5 x 10-18 (?Ne)
6.0 x 10-18(?Nh) From R.A. Soref B. R.
Bennett Electrooptical Effects in Silicon Jour.
Of Quan. Elec. 1987.
7
p-i-n Si Optical Modulators 4/4
  • Simulation results show modulation can be
    optimized to 1.3GHz and a 180? at .7 mA of
    current.
  • However, performance is very dependant on doping
    profile and a critical dimensions are not very
    tolerant.
  • As of late 2003, fabrication is underway.

8
MOS Si Optical Modulators 1/4
  • Still uses the plasma dispersion effect, but
    implements a MOS capacitor to induce change in
    free carrier density instead of a
  • p-i-n device.
  • Again designed for single mode 1.55?m.

9
MOS Si Optical Modulators 2/4
  • Apply VD to poly. Charge accumulation on both
    sides of gate oxide.
  • ?Ne ?Nh ?/etoxt(VD VFB)
  • ?ne -8.8 x 10-22?Ne
  • ?nh -8.5 x 10-18(?Nh)0.8
  • ?? (2?/?)?neffL

10
MOS Si Optical Modulators 3/4
  • Implemented phase shifter in both arms of a MZI.
  • For VD 7.7V ? 16dB total switch.
  • Loss is the big key 15.3dB insertion loss
    (4.3dB from coupling 6.7dB from poly guides).

11
MOS Si Optical Modulators 4/4
Switching test on psuedo-random time signal.
See 3dB roll off at gt1GHz from MOS cap.
12
Conclusion
  • MOS modulator has poor loss figures and still an
    order of magnitude slower than commercial
    modulators. Intel argues these can both be
    theoretically fixed by decreasing the size of the
    device and using Si in the guide region instead
    of poly (still integrable?).
  • P-i-n modulator is still being fabricated and
    depends on its optimal design for the high values
    achieved, so potentially success or failure from
    fabrication runs.
Write a Comment
User Comments (0)
About PowerShow.com