Title: Profile Extraction with Specular Spectroscopic Scatterometry
1Profile Extraction with Specular Spectroscopic
Scatterometry
- First SFR Annual Review
- November 8, 1999
- Xinhui Niu, Nickhil Jakatdar, Junwei Bao Costas
Spanos - Berkeley, CA
This work aims to deliver fast, economic, in-situ
analysis of patterned wafers, that today relies
heavily on off-line CD-SEM and CD-AFM Metrology.
2Specular Spectroscopic Scatterometry
- 0th order, broadband detection
- 1D gratings and 2D symmetric gratings
- Use spectroscopic ellipsometers
sinqm sinqiml/D sinqmlt1
l
Cut-Off Pitch
600 300 400 200 250 125 (in nm)
3Rigorous Coupled Wave Analysis
- Fourier expansion of the grating profile.
- Eigen system formulation.
- Linear system solution of EM field.
- In theory, this approach is rigorous.
- Enough orders need to be retained for
simulation accuracy. - The Grading Tool Kit (GTK) Software has been
released.
4Specular Spectroscopic Scatterometry Flow
Library Generation
Ellipsometry Measurement
Reconstructed Profile
Analysis
5Specular Spectroscopic Scatterometry Setup
- Periodic grating on mask ( 50 mm 50 mm area -
typical spot size of production spectroscopic
ellipsometers) - line/space specified
- Provide optical constants for each film in the
stack - Broadband (240-800 nm)
- Specify variability expected in process (in CD
thickness) - range around nominal in nm
- Specify spectroscopic ellipsometer/reflectometer
angle of incidence - Save broadband tan y and cos D values
- Specify accuracy requirements
- down to sub-nm (this automatically decides
library size)
6Measured and Simulated tan(Y) and cos(D)
measured by KLA-Tencor 1280
Tan(Y)
Cos(D)
Simulated by GTK
7Monte Carlo Profile Library Generation
top
Use primitives to classify profiles. 180000
profiles 53 wavelengths 22 layers 1.5 sec/profile
on a 500 MHz, P-III
middle
bottom
8GTK Interface is available at http//sfr.berkeley.
edu
9Profile Extraction over the entire Metal FEM
CD-SEM (Top CD)
Correlation 0.92
CD (in nm)
Profile Extraction
Site Number
SSS (Top CD)