Small Feature Reproducibility Measuring, Understanding and Controlling Variability in Sub-quarter micron patterning

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Small Feature Reproducibility
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Small Feature Reproducibility Measuring,
Understanding and Controlling Variability in deep
sub-micron patterning

• UC-SMART Major Program Award
• E. Aydil, J. Bokor, N. Cheung, D. Dornfeld, B.
  Dunn, D. Graves, E. Haller,
• M. Lieberman, A. Neureuther, K. Poolla, R. Smith,
  O. Solgaard C. Spanos
• University of California
• Berkeley, Davis, Los Angeles, Santa Barbara
• 11/8/99

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Program Goals

• Cultivate a new discipline that focuses on the
  reproducibility of small features.
• Pursue solutions by focusing on
• fundamental understanding
• modeling variability mechanisms
• sensing variability causes during production
• Our context is lithography, plasma, CMP,
  diffusion, and the way these steps interact with
  each other.

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Target Technologies

• Lithography 193 / 157 / 14nm (0.18mm - 0.05mm)
• Plasma and Reactive Ion Etching
• Chemical Mechanical Polishing
• Transient Enhanced Diffusion
• Sensors and Metrology for the above

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Small Feature Reproducibility

• Capture
• In-situ and off-line metrology
• Hierarchical Analysis of Variance
• Understand
• Resist, Plasma, Diffusion Modeling
• Variability Impact on Device / Interconnect
  Performance
• Control
• on-wafer / real-time / in-situ sensors
• run-to-run and real-time control
• process diagnosis
• chamber, process and product design

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Major Program Thrusts
Lithography
Plasma Etching
SFR
TED
Education
CMP
Sensor Integration
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Changes since May, 1999

• Professor Eugene Haller (UCB) joined us to work
  on transient enhanced diffusion in the second
  year.
• Professor Tsue-Jae King (UCB) helped us re-design
  the major undergraduate processing class.
• Professor Eray Aydil (UCSB) joined us to work on
  in-chamber plasma sensors.
• Aplex left the group (and the business),
  Nanometrics joined the group.
• The 6-inch conversion for the Berkeley Microlab
  has been funded by other means and is on its way.

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Industrial Relations

• Held two workshops (11/17/98 and 11/8/99), annual
  review (5/13/99).
• Established industrial mentors, 15-member
  steering committee.
• Opened bi-weekly seminars to industry via the Web.

• Our interactions database captures broad
  interactions since the beginning of this program.

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Technology Transfer

• Many visits, discussions, presentations.
• Bi-weekly seminar regularly attended by project
  mentors via simulcast on our web site.
• Timbre Technology, winner of Haas business plan
  competition, received seed funding.
• Auto calibration of lithography simulators.
• Scatterometry based profile reconstruction.
• Autonomous Wafer Sensors (AWS)
• Autonomous / modular temperature measurement
  wafers.
• Plasma temperature metrology (gt40 sensors/wafer,
  gt1Hz full field monitoring, new capabilities).

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Highlights...

• Our second year has been approved by the state,
  after a successful first year report in September
  1999.
• Bi-weekly teleconferencing seminars continue with
  technical talks this semester.
• 30 graduate students, 12 Professors, 4 UC
  campuses
• SOPRA Spectroscopic Ellipsometer
• CMP Cleaner
• CMP in place
• New P5000 identified at Intel, refurbished by
  AMAT
• MR2 substituted with M2I, received from Novellus
  last week. New room completed.
• 6-inch conversion under way
• New teaching lab operational!

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http//sfr/berkeley.edu

• Depository for
• publications
• resumes
• project database
• meeting agendas
• demonstrations
• posters
• presentations
• New software for presenting
• inter-campus, inter-industry,
• interactive, technical seminars.

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http//sfr.berkeley.edu
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Todays Objectives

• 1. Present and discuss Progress.
• 2. Discuss 2000-2002 ideas.
• Two year extension proposal due late spring 2000.
• 3. Bring, PIs, students, industrial participants
  together.

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Plans for 2000 renewal

• The theme for 1998-2000 was
• how to measure, understand and model small
  feature reproducibility.
• The theme for 2000-2002 might be

why reproducibility matters and how to control
it
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What really limits these numbers?
ITRS Conference7/99
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CD Metrology will need a (R)evolution...
ITRS Conference7/99
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General Reproducibility Model
Circuit performance model, predict and improve
CD, thin films measure and model
Fundamental causes optics, chemistry, etc. model
and understand
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People to Meet and Places to Go

• Web site, etc.
• Timothy D. Duncan
• 524 Cory Hall, CSG
• phone [phone]
• fax [phone]
• tduncan_at_eecs.berkeley.edu

Administrative Support Debra Krauss 558 Cory
Hall, ERL phone [phone] fax (510)
642-2739 debrak_at_eecs.berkeley.edu

• Account Management
• Brad Dexter
• 558 Cory Hall, ERL
• phone [phone]
• fax [phone]
• bdexter_at_eecs.berkeley.edu

University of California, Berkeley CA, 94720-1770
http//sfr.berkeley.edu Access restricted by
password.
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