EE%205340%20Semiconductor%20Device%20Theory%20Lecture%207%20-%20Fall%202009

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EE%205340%20Semiconductor%20Device%20Theory%20Lecture%207%20-%20Fall%202009

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Title: Semiconductor Device Theory Author: Dr. Ronald L. Carter Last modified by: UTA Created Date: 8/25/1998 6:32:46 PM Document presentation format –

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Title: EE%205340%20Semiconductor%20Device%20Theory%20Lecture%207%20-%20Fall%202009


1
EE 5340Semiconductor Device TheoryLecture 7 -
Fall 2009
  • Professor Ronald L. Carter
  • ronc_at_uta.edu
  • http//www.uta.edu/ronc

2
Second Assignment
  • Please print and bring to class a signed copy of
    the document appearing at
  • http//www.uta.edu/ee/COE20Ethics20Statement20F
    all2007.pdf

3
Diffused or ImplantedIC Resistor (Fig 2.451)
4
An IC Resistor with L 8W (MK)1
5
Typical IC dopingprofile (MK Fig. 2.441)
6
Mobilities
7
IC Resistor Conductance
8
An IC Resistor with Ns 8, R 8Rs (MK)1
9
The effect of lateral diffusion (MK1)
10
A serpentine patternIC Resistor (MK1)
  • R NSRS 0.65?NCRS
  • note RC 0.65?RS

11
Fermi Energy
  • The equilibrium carrier concentration ahd the
    Fermi energy are related as
  • The potential f (Ef-Efi)/q
  • If not in equilibrium, a quasi-Fermi level
    (imref) is used

12
Electron quasi-Fermi Energy (n no ?n)
13
Hole quasi-Fermi Energy (p po ?p)
14
Ex-field when Ef - Efi not constant
  • Since f (Ef - Efi)/q Vt ln(no/ni)
  • When Ef - Efi is position dependent,
  • Ex -df/dx -d(Ef-Efi)/dx - Vt
    dln(no/ni)/dx
  • If non-equilibrium fn (Efn-Efi)/q Vt
    ln(n/ni), etc
  • Exn -dfn/dx -Vt dln(n/ni)/dx

15
Si and Al and model (approx. to scale)
metal
n-type s/c
p-type s/c
Eo
Eo
Eo
qcsi 4.05 eV
qcsi 4.05 eV
qfm,Al 4.1 eV
qfs,n
qfs,p
Ec
Ec
EFm
EFn
EFi
EFi
EFp
Ev
Ev
16
Making contact be-tween metal s/c
  • Equate the EF in the metal and s/c materials far
    from the junction
  • Eo(the free level), must be continuous across the
    jctn.
  • N.B. qc 4.05 eV (Si),
  • and qf qc Ec - EF

qc (electron affinity)
qf
(work function)
Ec
EF
EFi
qfF
Ev
17
Equilibrium Boundary Conditions w/ contact
  • No discontinuity in the free level, Eo at the
    metal/semiconductor interface.
  • EF,metal EF,semiconductor to bring the electron
    populations in the metal and semiconductor to
    thermal equilibrium.
  • Eo - EC qcsemiconductor in all of the s/c.
  • Eo - EF,metal qfmetal throughout metal.

18
Ideal metal to n-typebarrier diode (fmgtfs,Va0)
n-type s/c
metal
  • No disc in Eo
  • Ex0 in metal gt Eoflat
  • fBnfm- cs elec mtl to s/c barr
  • fifBn-fn fm-fs elect s/c to mtl barr

Eo
qcs
qfm
qfi
qfs,n
qfBn
Ec
EFm
EFn
EFi
Depl reg
Ev
qfn
19
References
  • 1Device Electronics for Integrated Circuits, 2
    ed., by Muller and Kamins, Wiley, New York, 1986.
    See Semiconductor Device Fundamentals, by
    Pierret, Addison-Wesley, 1996, for another
    treatment of the m model.
  • 2Physics of Semiconductor Devices, by S. M. Sze,
    Wiley, New York, 1981.
  • 3Semiconductor Physics Devices, 2nd ed., by
    Neamen, Irwin, Chicago, 1997.
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