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Temperature Sensitive Microelectromechanical Systems

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Fixed Mounting. CCD camera, beam splitter, collimated light source. Leveling. all surfaces with mounting plates or rods. the system is leveled to the Silicon wafer ... – PowerPoint PPT presentation

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Title: Temperature Sensitive Microelectromechanical Systems


1
Temperature Sensitive Micro-electro-mechanical
Systems
  • Amy Kumpel
  • Richard Lathrop
  • John Slanina
  • Haruna Tada
  • Tufts University
  • TAMPL REU 1999

2
Overview
  • Background information of T-MEMS
  • current project goals
  • Experimental Setup
  • recent modifications
  • how it works
  • Experimental Results
  • imaging
  • numerical model
  • Conclusion and future work

3
An Introduction to T-MEMS
  • Measurement and characterization
  • mechanical properties of micro-scale devices
  • thermal properties of device materials under high
    temperatures
  • Application to rapid thermal processing (RTP)

4
Composition of T-MEMS
  • Tri-layered cantilever beams
  • 1.03 ?m SiO2, 0.54 mm poly-Si
  • 0.19 ?m SiO2 (thin, protective coat)

5
Composition of T-MEMS
  • Tri-layered cantilever beams
  • 1.03 ?m SiO2, 0.54 mm poly-Si
  • 0.19 ?m SiO2 (thin, protective coat)

6
Fabrication Process
  • Beams are processed at 840C
  • initial experimental condition is room
    temperature
  • Upward room temperature curvature
  • due to differences in ?th of poly-Si and SiO2
    (beams bend downward when heated)
  • Initial curvatures vary with material and/or
    deposition rate
  • typical curvatures range from 5 to10 ?m for a
    100mm poly-Si beam

Poly-Si
SiO2
7
Our Goals
  • Modify the experimental setup to decrease system
    error
  • Collect curvature data from poly-Si beams
  • Determine Youngs Modulus, E(T), and the
    coefficient of thermal expansion, ?(T), of thin
    films (poly-Si, SiNx) at high temperatures
  • Improve method for curve fitting and resolution
    analysis

8
Experimental Setup
9
Modifications
  • Fixed Mounting
  • CCD camera, beam splitter, collimated light
    source
  • Leveling
  • all surfaces with mounting plates or rods
  • the system is leveled to the Silicon wafer
    (sample)
  • Alignment
  • collimated light source to beam splitter
  • CCD camera to beam splitter
  • light source centered in the IMAQ image when
    aligned

10
Experimental Setup with Modifications
11
Experimental Procedure
  • Center sample to CCD camera
  • Heat T-MEMS (slowly) to 800C using W-halogen
    lamp then gradually cool to room temperature
  • Save the beam image every 20-30 seconds during
    the run
  • Set LabVIEW SCXI program to record temperature
    vs. time data

12
Imaging Results
13
Imaging Results
14
Determining E(T) and ?(T)
  • Two material properties approximate beam
    curvature for both Poly-Si and SiO2
  • Youngs Modulus (E)
  • Coefficient of Thermal Expansion (a)
  • Estimate E(T) from previous publications
  • Find a best fit ?(T) using a numerical model of
    the thin film poly-Si layer

15
Preliminary Results for a(T) of Poly-Si
Temperature (C)
16
Conclusion
  • Modified setup for increased accuracy
  • Acquisition of data with new setup
  • Used numerical method for determining the thermal
    properties

17
Future Work
  • Create x-y-z stage for easy movement of sample
  • Take more data with new setup
  • Modify numerical method for thermal properties
  • Get more values for E(T) and ?(T)
  • Modify LabVIEW programs
  • Help Haruna with her thesis
  • MACIS or MANTIS?

18
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