Alcohol Bath Drying

1
Alcohol Bath Drying
In the semiconductor industry, Model 610
controllers and HC gas sensors are used in wafer
drying processes, to detect combustible
compounds such as, Isopropyl Alcohol vapor
build-up that accumulates in the alcohol
dryers. The 4 inch diameter wafers are washed to
remove chemical residue and then dipped in an
alcohol bath to remove any moisture. A venting
system is used to evacuate any vapors that might
accumulate in the room. The HC gas sensors are
installed in the ventilation ductwork and set to
alarm at 20 LEL.
Exhaust System
Alcohol Vapors
Part No. 10059-1 Gas Sensor
610