The next generation solar technology

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Crystalline Silicon on Glass
The next generation solar technology
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Crystalline Silicon on Glass
Silicon Preparation Process
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3mm
Borosilicate Glass
Texture Coat Both Surfaces (Dipping)
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SiN
3mm
Borosilicate Glass
Deposit Anti-Reflection Coating (PECVD)
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Si
1.5 ?m
SiN
3mm
Borosilicate Glass
Deposit Silicon Film(PECVD)
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0
Si
1.5 ?m
SiN
3mm
Borosilicate Glass
Crystallise Si
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0
Si
1.6 ?m
SiN
3mm
Borosilicate Glass
Anneal Defects
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0
Si
1.5 ?m
SiN
3mm
Borosilicate Glass
Hydrogen Passivation
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0
Si
1.5 ?m
SiN
3mm
Borosilicate Glass
Hydrogen Passivation
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Crystalline Silicon on Glass
Device Fabrication Process
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Cell Separation Grooves (Laser)
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Cell Separation Grooves (Laser)
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P150W Resin coating(Spray then dry at 90 C)
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Crater Openings in P150W(Ink Jet)
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Crater Openings in P150W(Ink Jet)
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Crater Etch(5min Purple Etch)
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Crater Etch(5min Purple Etch)
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Crater Reflow
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Crater Reflow
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Dimple Openings in P150W(Ink Jet)
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Dimple Openings in P150W(Ink Jet)
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Dimple Etch(10sec Purple Etch)
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Aluminium Deposition(100nm Sputter)
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Aluminium Deposition(100nm Sputter)
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Metal Scribing(Laser)
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Completed CSG Structure