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MESFETs

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Fundamentals of Nanoelectronics Lecture 7 MESFETs Schottky Barrier Devices Heterojunction Transistor HEMTs * In Ga As/In P heterojunction References: Solid State ... – PowerPoint PPT presentation

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Title: MESFETs


1
Fundamentals of Nanoelectronics
Lecture 7 MESFETs Schottky Barrier
Devices Heterojunction Transistor HEMTs
2
  • Outline
  • MESFETs
  • Schottky Barrier Devices
  • Heterojunction Bipolar Transistor
  • High Energy Mobility Transistors (HEMTs)

3
MESFET
Metal Epitaxial
Semiconductor Field Effect Transistor
  • Gate looks like Schottky diode
  • Dont forward bias

Schottky diode
gate
source
drain
metal (e.g. TiAu)
ohmic
ohmic
depletion region
n (heavy)
Insulating substrate
4
  • MESFETs are quite similar to a JFET in
    construction and terminology
  • The difference is that instead of an using a p-n
    junction for a gate, a Schottky (metal
    -semiconductor) junction is used
  • MESFETs are usually constructed in compound
    semiconductor technologies lacking high quality
    surface passivation such as GaAs, InP, or SiC,
    and are faster but more expensive than
    silicon-based JFETs or MOSFETs
  • Production MESFETs are operated up to
    approximately 30 GHz, and are commonly used for
    microwave frequency communications and radar

5
  • From a digital circuit design perspective, it is
    increasingly difficult to use MESFETs as the
    basis for digital integrated circuits as the
    scale of integration goes up, compared to CMOS
    silicon based fabrication
  • The absence of an insulator under the gate
    implies that the MESFET gate should, in
    transistor mode, be biased such that the metal
    semiconductor diode is not forward biased

6
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7
MESFET
Schottky diode
gate
source
drain
metal (e.g. TiAu)
ohmic
ohmic
depletion region
Xdep(x)
a
n (heavy)
b(x)
Insulating substrate
When they touch, define VDS,sat
8
HEMT High Electron Mobility Transistor
Schottky diode
gate
source
drain
metal (e.g. TiAu)
ohmic
ohmic
n-AlGaAs
tb
i-AlGaAs
d
2DEG
i-GaAs
Insulating substrate
9
  • A HEMT is a field effect transistor incorporating
    a junction between two materials with different
    band gaps as the channel instead of a doped
    region, as is generally the case for MOSFETs
  • A commonly used material combination is GaAs with
    AlGaAs, though there is wide variation, dependent
    on the application of the device.
  • Devices incorporating more indium generally show
    better high-frequency performance,
  • Gallium nitride HEMTs have a greater high - power
    performance

10
  • In general, to allow conduction, semiconductors
    need to be doped with impurities to generate
    mobile electrons in the layer
  • However, this causes electrons to slow down
    because they end up colliding with the impurities
    which were used to generate them in the first
    place
  • HEMT resolves this contradiction by use of high
    mobility electrons generated using the
    heterojunction of a highly - doped wide - bandgap
    n - type donor-supply layer (such as AlGaAs) and
    a non - doped narrow - bandgap channel layer with
    no dopant impurities (such as GaAs)

11
  • The electrons generated in the n - type AlGaAs
    thin layer drop completely into the GaAs layer to
    form a depleted AlGaAs layer,
  • The heterojunction created by different band gap
    materials forms a quantum well in the conduction
    band on the GaAs side where the electrons can
    move quickly without colliding with any
    impurities because the GaAs layer is undoped, and
    from which they cannot escape
  • The effect of this is to create a very thin layer
    of highly mobile conducting electrons with very
    high concentration, giving the channel very low
    resistivity (high electron mobility)

12
  • This layer is called a two-dimensional electron
    gas
  • Like all the other types of FETs, a voltage
    applied to the gate alters the conductivity of
    this layer
  • Applications are similar to MESFETs - microwave
    and millimeter wave communications, imaging,
    radar, and radio astronomy
  • Any application where high gain and low noise at
    high frequencies are required

13
  • HEMTs have shown current gain of gt600GHz and
    power gain to gt1THz
  • Heterojunction bipolar transistors (HBTs) have
    demonstrated a current gain at frequencies over
    600 GHz
  • HEMTs can be used as discrete transistors but
    more often are used in the form of an integrated
    circuit called a MMIC (Monolithic Microwave
    Integrated Circuit)
  • HEMT devices are found in many types of equipment
    ranging from cellphones and DBS receivers to
    electronic warfare systems such as radar and
    radio astronomy

14
Band diagram
15
Current
16
Integrating
17
Bipolar Junction Transistor (BJT)
  • Two back - to - back pn junctions
  • Close enough for minority carriers to interact
    (can quickly diffuse in the base region)
  • Far apart enough so that the depletion regions do
    not interact (i.e., punchthrough)

18
Basic BJT Characteristics
p type base
n type collector
n type emitter
electrons
electrons
Ic
Ie
recombine
a few holes
holes
Ib
What fraction of minority carriers make it
across? Emitter injection efficiency Current
transfer ratio
19
Basic BJT Characteristics
Minority carrier transit time ?t
p type base
n type collector
n type emitter
Ic
Ie
Minority carrier lifetime ?p
Ib
For efficient transistor ? 1 Base current? Gain
20
BJT, npn, forward active
21
BJT, npn, reverse active
22
BJT, npn, saturation
23
BJT, npn, cutoff
24
BJT Currents
25
Normal Active Schematic
p type base
n type collector
n type emitter
electrons
electrons
Ic
Ie
a few holes
Bad for base resistance. Bad for E-B capacitance.
So bad for speed.
26
Normal Active Schematic
p type base
n type collector
n type emitter
electrons
electrons
Ic
Ie
recombine
a few holes
holes
Ib
27
Normal active Heterojunction Bipolar Transistor
(HBT)
p type base
n type collector
n type emitter
electrons
Ic
electrons
Ie
a few holes
Shockley, Kroemer Holes exponentially suppressed
if emitter is wider gap.
28
  • The heterojunction bipolar transistor (HBT) is an
    improvement of the bipolar junction transistor
    (BJT) that can handle signals of very high
    frequencies up to several hundred GHz
  • It is common in modern ultrafast circuits, such
    as used radio - frequency (RF) systems
  • The principal difference between the BJT and HBT
    is the use of differing semiconductor materials
    for the emitter and base regions, creating a
    heterojunction
  • The effect is to limit the injection of holes
    into the base region, since the potential barrier
    in the valence band is so large
  • Unlike BJT technology, this allows high doping to
    be used in the base, creating higher electron
    mobility while maintaining gain

29
HBT
30
Heterojunctions
Al Ga As
Ga As
? E C 0.77 eV ? E V 0.48 eV
31
Heterojunctions
In P
In Ga As
? E C 0.26 eV ? E V 0.34 eV
31
32
Heterojunctions
Al Sb
In As
? E C 1.35 eV ? E V - 0.13 eV
32
33
Heterojunctions
Ga Sb
In As
? E C 0.88 eV ? E V - 0.51 eV
33
34
Modulation Doping
Put them in the AlGaAs, Let the electrons fall
into the GaAs (Dingle 78)
Instead of putting the dopants in the GaAs.
34
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