The Michigan Nanofabrication Facility MNF Formerly SolidState Electronics Laboratory, SSEL - PowerPoint PPT Presentation

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The Michigan Nanofabrication Facility MNF Formerly SolidState Electronics Laboratory, SSEL

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MBE, MOCVD, LPE Growth Tools. Submicron Lithography. ECR Etching and Pattern Transfer. Raith E-Beam Lithography. Silicon: Full 4' Wafer Processing: ... – PowerPoint PPT presentation

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Title: The Michigan Nanofabrication Facility MNF Formerly SolidState Electronics Laboratory, SSEL


1
The Michigan Nanofabrication Facility
(MNF)(Formerly Solid-State Electronics
Laboratory, SSEL)
  • 7000 sq. ft. of Clean-room Space
  • Compound Semiconductors
  • MBE, MOCVD, LPE Growth Tools
  • Submicron Lithography
  • ECR Etching and Pattern Transfer
  • Raith E-Beam Lithography
  • Silicon Full 4 Wafer Processing
  • High-Temperature Processing (24 Tubes)
  • CVD Thin-Film Deposition
  • Deep Silicon Etching
  • Wafer Bonding and Alignment
  • 3µm CMOS/BiCMOS, and SOI Processes
  • Device/IC Test Capability
  • Separate Instructional Facility
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