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Multilevel Interconnect Architectures

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Title: Multilevel Interconnect Architectures


1
Multilevel Interconnect Architectures for
Gigascale Integration (GSI)
A thesis proposal Raguraman Venkatesan Advisor
Prof. James D Meindl Co-advisor Prof. Jeffrey A
Davis
Georgia Institute of Technology, Atlanta April
29th, 2002 Sponsored by SRC and DARPA
2
Outline
  • Problem Statement
  • Origin and History of the Problem
  • Proposed Research and Current Status
  • Work remaining to be done
  • List of Contributions
  • List of Publications

3
Outline
  • Problem Statement
  • Origin and History of the Problem
  • Proposed Research and Current Status
  • Work remaining to be done
  • List of Contributions
  • List of Publications

4
Problem Statement
  • Interconnects are the bottleneck, not transistors
  • Key technology metrics
  • Speed
  • Power
  • Cost

Source Meindl et al., IEDM, 2001
5
Power Density Gets Worse
Source Shekhar Borkar, Intel Corporation
6
Interconnect Power Dissipation
  • Interconnect power
  • 30-60 of total power dissipation !
  • Power-aware interconnect design methodology
    strongly needed

Source Chandra, Kapur and Saraswat, IITC, 2002
(in press)
7
Multilevel Interconnect Layers
  • Lower cost gt Optimal design of metal layers

Source International Technology Roadmap for
Semiconductors (ITRS), 1998
8
Bottomline
  • Design multilevel interconnect system properly !!

9
Outline
  • Problem Statement
  • Origin and History of the Problem
  • Proposed Research and Current Status
  • Work remaining to be done
  • List of Contributions
  • List of Publications

10
Origin and History of the Problem
  • Rents rule
  • T Number of I/Os
  • N Number of logic gates
  • p Rents exponent
    p0.6, k4, N1E9
  • k Rents coefficient T 1E7

Source Landman Russo, IEEE Trans. Computers,
Dec 1971
11
  • Stochastic Interconnect Wiring Distribution
  • a priori prediction of wire length and number of
    wires

Source Davis, De and Meindl, Trans. Electron
Devices, Mar 1998
12
  • Wire Sizing
  • Reverse scaling
  • 2 wire widths Local global
  • 3 wire widths Local, semi-global and global
  • Double pitches for every 2 metal layers
  • 30 scaling rule
  • Linear dimensions
    30
  • Area
    50

Source Sai-Halasz Proc. IEEE, Jan 1995
13
  • Wire layer assignment
  • Input Wire pitches
  • Delay dependent layer assignment
  • Optimum number of repeaters
  • Cost function Number of metal layers
  • Computationally inefficient algorithm
  • Requires several iterations
  • Area-inefficient solution

Source Kahng and Stroobandt, SLIP Workshop, 2000
14
Origin and History of the Problem
  • Developed 3-tier interconnect design methodology
  • Local
  • Semi-global
  • Global
  • Using
  • Wire length information (Stochastic Distribution)
  • Pitch information (rc time delay models)

Source Davis, De and Meindl, Trans. Electron
Devices, Mar 1998
15
Outline
  • Problem Statement
  • Origin and History of the Problem
  • Proposed Research and Current Status
  • Work remaining to be done
  • List of Contributions
  • List of Publications

16
Proposed Research Tasks
  • Task I Optimum n-tier methodology
  • Task II Repeater insertion in n-tier
    methodology
  • Task III Complete physical models for
    transient
  • response of distributed rlc
    lines
  • Task IV Compact physical models for time
    delay,
  • crosstalk and repeater
    insertion
  • Task V Impact of inductance on multilevel
  • interconnect architectures
  • Task VI Impact of parameter variations on
    clock skew
  • Task VII Develop MINDS (Multilevel
    Interconnect Network
  • Design Simulator)

17
Task I Optimal n-tier multilevel
interconnect methodology
  • New n-tier methodology
  • ASIC case study from ITRS 100nm generation
  • Three optimizations
  • Macrocell Area
  • Clock Frequency
  • Number of metal levels

18
Some definitions
Level single layer of parallel interconnects

Pair Two adjacent orthogonal levels having same
dimensions
Tier Collection of Pairs having same dimensions
19
Optimal Multilevel Architecture
  • Area is wire limited

Available area Area required
for wiring
20
  • rc models for interconnect time delay
  • clock frequency, wire length wire
    pitch

Source Sakurai, Trans. Electron Devices, 1993
21
n Tier Interconnect Network
22
ITRS 100nm Case Study
  • 100 nm technology
  • ASIC macrocell with 11.3M logic gates
  • ( 68M transistors)
  • Copper interconnects
  • n8 metal levels

Source International Technology Roadmap for
Semiconductors (ITRS), 1998
23
Conventional design
Double pitches for every pair of layers
24
Optimum n-tier architecture
A Min. area B Max. freq C Min. levels
25
Optimization results
  • compared to doubling of pitches design

26
Task II Repeater insertion in
n-tier methodology
  • Repeater insertion models and methodology
  • ASIC case study from ITRS 100nm generation
  • Four optimizations
  • Macrocell Area
  • Power dissipation
  • Clock Frequency
  • Number of metal levels

27
Advantages of Repeaters
  • Single driver (No repeaters)
  • With repeaters

Source Bakoglu and Meindl, Trans. Electron
Devices, May 1985
28
Sub-optimal repeater design
29
Top-down Repeater Insertion Methodology
30
Minimizing Macrocell Area
31
Minimizing Macrocell Area
32
Minimizing Power Dissipation
Area and power are minimized simultaneously!
33
Maximizing Clock Frequency
34
Minimizing Number of Levels
35
Optimization Results
  • compared to n-tier design without
    repeaters

36
SWOT Analysis
  • Strengths Novel layer width estimator
  • Weaknesses System level tool makes
    approximations
  • Opportunities Enables technology forecasting
    for any future generation
  • Threats Unless the future generation uses
    wireless interconnects !

37
Task III Complete Transient Model for
Distributed rlc Lines with Cload
  • Previous Work
  • Model derivation
  • Single and two coupled line transients

38
Previous Work
  • Rochesters model- Time delay and repeater
    insertion in rlc lines. Expressions are curve
    fitted, not analytical.

Source Ismail and Friedman, Trans. VLSI, Apr
2000
39
Previous Work
  • Georgia Tech - Compact models for distributed rlc
    lines
  • Use modified Bessel functions
  • Time domain response of finite, open-ckt
    distributed rlc line
  • Compact expressions for time delay and crosstalk

Source Davis and Meindl, Trans. Elec. Dev,
Nov 2000
40
Problem Definition
  • Transmission line theory Multiple reflections
    at
  • load
    and source ends

41
Basis Variables
42
Single Line Transients
43
2 Coupled Line Transients
44
Task IV Compact Models for
Time Delay, Crosstalk
Repeater Insertion
  • Unified time delay model
  • Unified crosstalk model
  • Optimum repeater insertion models
  • New design plane

45
Unified Time Delay Model
  • Unified Applicable to rc and rlc lines

46
Unified Time Delay Model
Source Ismail and Friedman, T. VLSI, Apr 2000
47
Unified Crosstalk Model
Source Cao et al. IEDM 2000
48
Repeater Models
49
Repeater Models
50
Repeater Models
51
Can Repeaters Reduce Crosstalk?
  • Inserting repeaters
  • Thinner wires, same delay
  • More RC gt less LC behaviour
  • Repeaters increase
  • more grounding
  • Inserting repeaters
  • might decrease crosstalk
  • without increasing time delay!

52
Design Plane
53
Design Plane
54
Design Plane
55
Outline
  • Problem Statement
  • Origin and History of the Problem
  • Proposed Research and Current Status
  • Work remaining to be done
  • List of Contributions
  • List of Publications

56
Task V Effects of Inductance on n-tier Design
  • Investigate effects of inductance on repeater
    insertion in multilevel interconnect
    architectures
  • Optimum aspect ratio for different tiers
  • Impact of non-ideal ground return paths on
    repeater-inserted multilevel interconnect systems

Source Naeemi et al., IEDM 2001
57
Task VI Effects of Parameter Variations
on Clock Skew
  • Previous work Used rc models
  • Model a high speed clock distribution network
  • Use new compact rlc models to investigate clock
    skew

Source Kowalczyk et al., ISSCC 2001
Anderson et al., ISSCC 2002
58
Task VII MINDS
  • Multilevel Interconnect Network Design Simulator
  • Current capabilities
  • n-tier design, with repeaters, using rc models
  • Via blockage, power/ground blockage
  • Variable pitches, variable wiring efficiency
  • Enhancements
  • Include rlc models
  • Optimum aspect ratio
  • Non-ideal return paths

59
Timeline of Work Left
60
Outline
  • Problem Statement
  • Origin and History of the Problem
  • Proposed Research and Current Status
  • Work remaining to be done
  • List of Contributions
  • List of Publications

61
List of Contributions
62
List of Publications
  • Conference papers
  • R.Venkatesan, J.A.Davis and J.D.Meindl,
    Performance enhancement through optimal n-tier
    multilevel interconnect architectures,
    Proceedings of the Twelfth International IEEE
    ASIC/SOC conference, Washington DC, Sept. 15-18
    1999, pp. 19-23.
  • J.A.Davis, R.Venkatesan, K.A.Bowman and
    J.D.Meindl, Gigascale integration (GSI)
    interconnect limits and n-tier multilevel
    interconnect architectural solutions, Proceedings
    of the International Workshop on System Level
    Interconnect Prediction (SLIP), San Diego, April
    8-9 2000, pp. 147-148.
  • R.Venkatesan, J.A.Davis, K.A.Bowman and
    J.D.Meindl, Optimal repeater insertion for n-tier
    multilevel interconnect architectures,
    Proceedings of the Third International
    Interconnect Technology Conference, San
    Francisco, June 5-7 2000, pp. 132-134.
  • R.Venkatesan, J.A.Davis, K.A.Bowman and
    J.D.Meindl, Minimum power and area n-tier
    multilevel interconnect architectures using
    optimal repeater insertion, Proceedings of the
    International Symposium on Low Power Electronics
    and Design, Rapallo/Portofino Coast, Italy, July
    26-27 2000, pp. 167-172.
  • J.D.Meindl, R.Venkatesan, J.A.Davis, J.W.Joyner,
    A.Naeemi, P.Zarkesh-Ha, M.Bakir, T.Mule, P.A.Kohl
    and K.P.Martin, Interconnecting device
    opportunities for gigascale integration (GSI),
    International Electron Devices Meeting (IEDM),
    Washington D.C., Dec 2001, pp. 525-528.
  • R.Venkatesan, J.A.Davis and J.D.Meindl, A
    complete physical model for distributed RLC
    interconnects - transient voltage, time delay and
    crosstalk, to be published in the proceedings of
    the Design Automation Conference, New Orleans,
    June 2002.
  • A.Naeemi, R.Venkatesan and J.D. Meindl,
    System-on-a-chip global interconnect
    optimization, submitted to the ASIC/SOC
    Conference, Rochester, Sept 2002.
  • R.Venkatesan, J.A.Davis and J.D.Meindl, Time
    delay, crosstalk and repeater insertion models
    for high performance SOCs, submitted to the
    ASIC/SOC Conference, Rochester, Sept 2002.

63
List of Publications
  • Journal papers
  • J.A.Davis, R.Venkatesan, A.Kaloyeros, M.Bylansky,
    S.J.Souri, K.Banerjee, K.C.Saraswat, A.Rahman,
    R.Reif and J.D.Meindl, Interconnect limits on
    Gigascale integration (GSI) in the 21st century,
    Proceedings of the IEEE - special issue on limits
    to semiconductor technology, Vol. 89, No. 3,
    March 2001, pp. 305-324.
  • R.Venkatesan, J.A.Davis, K.A.Bowman and
    J.D.Meindl, Optimal n-tier multilevel
    interconnect architectures for gigascale
    integration, IEEE Transactions on VLSI Systems -
    special issue on System Level Interconnect
    Prediction, Vol. 9, No. 6, Dec 2001, pp. 899-912.
  • J.W.Joyner, R.Venkatesan, P.Zarkesh-Ha, J.A.Davis
    and J.D.Meindl, Impact of three dimensional
    architectures on homogenous digital circuits ,
    IEEE Transactions on VLSI Systems - special issue
    on System Level Interconnect Prediction, Vol. 9,
    No. 6, Dec 2001, pp. 922-928.
  • R.Venkatesan, J.A.Davis and J.D.Meindl, A
    complete physical model for distributed rlc
    interconnects with capacitive load Part 1
    Single line transients and coupled line
    crosstalk, to be submitted to the Trans. Electron
    Devices.
  • R.Venkatesan, J.A.Davis and J.D.Meindl, A
    complete physical model for distributed rlc
    interconnects with capacitive load Part 2
    Unified models for time delay, crosstalk and
    repeater insertion, to be submitted to the Trans.
    Electron Devices.
  • Book chapter
  • J.A.Davis and J.D.Meindl, Interconnect design
    issues and opportunities for Gigascale
    Integration, Kluwer Academic Publishers, in
    press.

64
Acknowledgements
  • Prof. James Meindl
  • Prof. Jeff Davis
  • Prof. Scott Wills
  • Jennifer Tatham
  • Dr. Keith Bowman
  • Dr. Payman Zarkesh-Ha
  • Dr. Azeez Bhavnagarwala
  • Dr. Chirag Patel
  • Azad Naeemi
  • James Joyner
  • Qiang Chen
  • Tony Mule
  • Raghunath Murali
  • Hiren Thacker

65
Thank You!
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