Current status of the BaD-ElPh project at ELETTRA - PowerPoint PPT Presentation

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Current status of the BaD-ElPh project at ELETTRA

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1st Workshop on Ultraviolet Techniques and Applications, October 8th ... Resolving Power: up to about 50.000. Beam in. Gratings efficiency. WUTA 08, LNF. 15.5 ... – PowerPoint PPT presentation

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Title: Current status of the BaD-ElPh project at ELETTRA


1
Current status of the BaD-ElPh project at ELETTRA
P. Vilmercati L. Petaccia S. Gorovikov M.
Barnaba C. Masciovecchio D. Cocco A. Bianco A.
Goldoni
1st Workshop on Ultraviolet Techniques and
Applications, October 8th-10th 2008 LNF,
Frascati.
2
Outline
BaD-ElPh beamline (Band Dispersion and
Electron-Phonon coupling studies)
  • photon source
  • beamline
  • experimental end station

Examples of experiments _at_ BaD-ElPh beamline
  • experimental determination of the inelastic
    electron mean free path at KElt10eV
  • electronic structure in a strongly correlated
    system

3
Photon source Figure 8 undulator
Flux_at_ 10eV 200mA 1015 photons/s/0.1bandwidth
Two sets of harmonics, integer (i1,2,) and
half-integer (i1/2,3/2,), having horizontal
and vertical linear polarization, respectively.
B.Diviacco et al. "New Insertion Devices for
ELETTRA", proc. 2001 Particle Accelerator
Conference
4
Beamline Layout a 4 meter NIM
Beam in
Energy range 4.6 - 26 eV with two gratings
(AlMgF2 - SiC) Photon flux 3x1012 photons/s _at_
8 eV (exit slit 150 µm) 6x1011 photons/s _at_ 19
eV (exit slit 300 µm) Resolving Power up to
about 50.000
5
Gratings efficiency
AlMgF2 1.500 l/mm
Efficiency
SiC 3000l/mm
Pt soon available!
6
Gratings resolving power
AlMgF2
  • SiC

20 eV, resolving power 45000 (10 µm) 12 eV,
resolving power 75000 (10 µm) 8 eV, resolving
power 50000 (10 µm)
7
Ar autoionization spectrum in the range 2P3/2
-2P1/2 recordered in first order light
Resolving power 28000 exit slit 50µm
12s
11s
13s
?E535µeV
9d
Ar 2P1/2
Ar 2P3/2
8
Ne 14s Rydberg line recorded in second order
light
9
Photon Flux at the end of the beamline
Measurements performed with a calibrated
photodiode set at the end of the beamline, just
before the experimental end-station.
10
BaD-ElPh experimental end-station
  • 4 axis manipulator with cryostat (15K with liquid
    He)
  • Fast entry lock
  • Preparation chamber
  • Sputter gun
  • Cleaver
  • Heating stage
  • several free flanges to mount evaporators
  • Experimental chaber
  • Phoibos 150
  • X-ray (Al, Mg) and UV (He discharge) sources
  • LEED

11
Performances of the Phoibos 150 provided by SPECS
Energy resolution 3.94 meV obtained in Gas
Phase with Pass Energy 1.4eV in LAD mode.
Angular Resolution 0.2deg
12
Experimental Performances of Phoybos 150
entrance slit 400µm exit slit 300µm
Ag Polycristal
f(x) c(abx)(1/(1exp((x-Ef)/(T/11604.5)))) c
676.29 4.09 a 20520 2.13e03 b
-2143.1 235 Ef 9.0996 0.000104 eV T
32.534 1.02 K
PE1eV
FWHM 9.8 meV
First derivative fit y y0 Aexp ( (x-x0) /
width)2 y0 1.8349 0.859 A 89.702
3.38 x0 9.0995 0.000178 width
0.0058939 0.000265
13
Electon inelastic mean free path of low kinetic
energy electrons
14
Inelastic mean free path the case of CoO.
The overlayer method
Photo-electrons
UV SR
insulator
metal
Offi, et al. PRB 77, 201101(R) 2008
15
Evaluation of the Mean Free Path
Inelastic mean free path is reduced of a factor 6
with respect to theoretical predictions!
Offi, et al. PRB 77, 201101(R) 2008
16
Phase transitions in Mott-Hubbard insulators.
(V1-xCrx)2O3 x0.011
Theoretical calculation predicts structures close
to Fermi level that have been observed only with
Hard X-Ray Photoemission.
hv 21 eV (He I)
M. Marsi et al. submitted.
17
Bulk sensitivity!
Comparison with theoretical calculations
M. Marsi et al. submitted.
18
Conclusions
WUTA 08, LNF
Conclusions
  • The BaD ElPh beamline is now operating and users
    are welcome to apply for beamtime.

Thank you for your attention!
19
Why a Figure 8 undulator?
Originally designed for soft X-rays _at_ Spring 8
(E8GeV)
UV-rays _at_ Elettra (E 2-2.4 GeV). Energy range
4.6eV (E2GeV), 6.7eV (E2.4GeV) 70eV (not used)
The power density is mainly distributed off-axis
can be screened with a suitable pinhole
aperture Reduced by a large factor the heat
load on optics
20
Experimental setup for resolution measurements
Gas Cell setup
Ar, Ne
Pico Amp.
21
Flux_at_ 10eV 200mA 1015 photons/s/0.1bandwidth
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