Y1: Low dose P implants into Si

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Y1 Low dose microbeam H and He implants into Si
Y1 Low dose P implants into Si
Y1 AFM studies of low dose H, He and P ion
tracks AFM studies of implanted P location by
in-situ cleavage
Y2 He and P implants through high resolution
resists for self-aligned contact synthesis
Y2 H and P implants through linear array of A/J
gates
Y3 He and P implants through self assembled
mono-layers (SAM) on Si/Au
Y3 Resist SAM development studies by STM/AFM
SEM
Y3 In-situ AFM imaging of P ion tracks through
resist/Si
Y3 P implants through linear gate array and
resist or SAM
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