Title: Digital VLSI Design
1Digital VLSI Design
- Full Automation
- Maximum benefit of scaling
- High speed ,low power
2Other logic design styles
3Pass Transistor Logic
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5Level restoration
6Swing Restored Pass Logic
7TRANSMISSION GATE
8Mux
9TG Xor
10DELAY OF N TRANSMISSION GATES
11REPEATERS
12Static Gates In Synchronous design
13Wire delays
14Electromigration (1)
15Impact of Interconnect Parasitics
16When to Consider Transmission Line Effects?
tr/tf gt 5 t flight lumped model
17Interconnect Delay with Inductive Effects
- For the design of critical performance nets (such
as clock distribution) on a processor chip,
inductance must be taken into consideration - Simulation result in (b) shows the effect of
ringing on a rising transition due to reflections
at a discontinuity on an inductive net - Additional delay due to settling time is incurred
if such ringing can not be eliminated by proper
transmission line design techniques
B
18Nature of Interconnect
19INTERCONNECT
20Wire Resistance
21Dealing with Resistance
22Resistance of a Wire (Rectangular Geometry)
- Resistance of a uniform slab
- R ? (l/A) (?/t) (L/W) where ? is the
resistivity in ohm-cm, t is the thickness in cm,
L is the length, W is the width, and A is the
cross-sectional area - Using the concept of sheet resistance, R
Rs (L/W) where Rs is called the sheet
resistance and given in ohms per square - Rs ? / t
- Apply to metal wire, poly line, or even a
diffused P or N area of sufficient length - Resistance of an FET transistor (linear)
- R Vds/Ids 1/?(Vgs Vt 0.5 Vds)
- As Vds ? 0,
- Rds ? 1/?(Vgs Vt) k(L/W)
- where k 1/?Cox(Vgs Vt)
23Polycide Gate Mosfet
24INTERCONNECT
25Capacitance The Parallel Plate Model
26Capacitance of the Interconnect Metal Wires
- For wide conductors with W gtgt H, capacitance to
substrate (of any ground plane) can be determined
as a parallel plate capacitor - C ?A/t where A is the planar area of
the wire and t is the thickness of the oxide - For most real conductors in todays IC
technology, fringing fields contribute a major
part of the line capacitance and must be included
in the capacitance calculations. - For W H (below), fringing fields add more than
the parallel plate portion to the total line
capacitance.!
R. W. Knepper SC571, page 4-15
27Fringing Capacitance
28Interwire Capacitance
29Metal Line Capacitance with Fringing Effect
- Solution by Yuan and Trick given at right assumes
the wire can be approximated by a piece of metal
with thickness t and two rounded edges - parallel plate portion with width equal to W
t/2 - fringing term due to two hemispherical ends with
exact solution to field equation - Example for wire of width W0.30 um, thickness t
0.30 um, and dielectric thickness h 0.35 um,
gives a result - C 0.13 fF/um
- where the fringing part is over ¾ of the
total capacitance.
30Fringing Capacitance Values
31Capacitance of Layered Multiple Conductors
- Structure of Interconnect
- Layers 1 and 3 run along page
- each can be assumed to act as a ground plane
(solid plane) - Layer 2 runs out of the page
- Equivalent capacitances per unit length
- Ctotal C21 C23 2 x C22
- C21 is from center conductor to lower ground
plane (layer 1) - C23 is from center conductor to upper ground
plane (layer2) - C22 is from center conductor to adjacent wire on
the right - C22 also occurs from center conductor to adjacent
wire on right assuming spacings are symmetrical - Equations at left give capacitance from center
conductor to one or both ground planes
32Capacitance of Layered Multiple Conductors
- Equations at left give capacitance per unit
length between center conductor and adjacent
conductor (C22) for both cases - One ground plane only (layer 1)
- Two ground planes (layers 1 2)
- Parameters
- T wire thickness
- H interlayer dielectric thickness
- S wire spacing
- W wire width
33Interconnect Cross-section for Dual Metal, Single
Poly System
34IDEAL WIRE
- No impact on electrical behaviour of circuits
- Whole wire is an equi-potential region
35INTERCONNECT DELAY Realistic Wire Models
- Lumped RC Delay Model
- T Network RC Delay Model
- Ladder Network Model
- Elmore Delay Model
36LUMPED C DELAY MODELif wire resistance small and
frequency is small
Vout VDD (1 e t / RONCL )
Vout VDD (e t / RONCL )
tphl / tpLH 0.69 RC
37Lumped RC-ModelsInaccurate estimate
38Tree RC-Models
39T-network Delay Model
- Star-delta-transformation
- VoutZAB/(ZABZBC)
- Vout(2/RC)/(S2/RC)(1/S)
- (1/s)-1/(s2/RC)
- U(t)1-exp(-2/RC)t
- FOR V50
- tp(RC ln2)/20.35 RC
40LADDER NETWORK RC-Delay
41THE ELMORE DELAY MODELmultiple branches- single
input
- For a step input Vin, the delay at any node can
be estimated with the Elmore delay equation - tDi ? Cj ? Rk
- For example, the Elmore delay at node 7 is give
by - R1 (C1 C2 C3 C4 C5 C6C7C8) (R6)
(C6C7C8) (R7) (C7 C8)
42Elmore delay model for (Distributed RC) Ladder
Network
- Delay in a distributed RC ladder network is given
by - ?n ½ R C n (n1)
- where R and C are the series resistance and
nodal capacitance for each section, and n is the
number of sections. - For n large, the above expression reduces to
- ? ½ r c l2
- where r and c are the resistance and
capacitance per unit length, and l is the total
length of the wire. - Note that interconnect delay is proportional to
the square of wire length.
43Reduction of wire delay
44Use of a Buffer Amplifier in a Long Line to
reduce delay
- Buffers may be used in long lines to reduce the
total line delay - Non-inverting line driver circuit having an
intrinsic delay ?buf - Total line delay becomes ½ rcl12 ?buf ½
rcl22 where l1 is the first line segment and l2
is the second line segment (l1 l2 l)
45Minimize delay
Reduction in overall line delay is achieved If
interconnect delay is to be negligible or ? w
?buf or 0.7 x ½ rcl2 ?buf where l is the
line segment length l ltlt v (2 ?buf / 0.7 rc)
--- upper bound
46- Example
- What is the intrinsic wire delay of a 0.18 um
CMOS technology minimum Cu wire on level M2 with
length 10 mm, thickness 0.3 um, width 0.3 um and
height 0.35 um above a M1 ground plane with SiO2
dielectric (neglecting M3 and above)? - r ?/A 24 ohm-um/(0.3 um x 0.3 um) 0.266
ohms/um - c 0.13 fF/um from equation on slide 4-11
- ? ½ rcl2 0.5 x 0.226 ohms/um x 0.13 fF/um x
(10,000 um)2 1.4 ns - How much will the delay become if a buffer with a
200 ps delay is inserted in the line center? - ? 2 x (¼ x 1.4 ns) 200 ps 0.9 ns
47Reducing RC-delay
Repeater
48Example---clock distribution network with
repeaters
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50Model for Distributed RC Line with Capacitive Load
RW
51- A simple model for a distributed RC interconnect
wire can be represented as shown at left - driver circuit with equivalent Rdrvr
- Receiver circuit with capac load Cload
- Interconnect with total resistance Rwire and
total capacitance Cwire - The total delay of the wire and load can be
written as - ?t (Rdrvr Rwire)(Cwire Cload) ½ RwireCwire
-
- The equivalent circuit at the bottom left gives
identical result to above RC model given that
delay ? ½ rcl2 - ½ RwireCwire
- RS Rdriv, CtCwire CL
52Including all parasitics, make simulation slow
and design optimization tedious
53For Easy Analysis of interconnects
- Ignore inductive effects if resistance of wire is
substantiale.g long aluminum wire - Ignore inductive effects if tr / tf is very large
- For short wire, ignore resistances
- Ignore inter-wire capacitance if wires run
together for short distance
54Efficient Interconnect hierarchy
55Complex logic gatesGATE LOGIC
56DYNAMIC LOGICyields SYNCHRONOUS DESIGN
57How long charge can remain stored at soft node?
Soft node
Is dynamic logic feasible as output is remaining
in tristate condition. Will it cause data to get
lost?
58Worst case hold time
59Worst case hold time
Vm
V omax
So charge leakage required time im
ms. Sufficiently large By that time, data would
remain logic1 and would have been used
60PRECHARGE EVALUATE LOGIC
61Precharge/ evaluation
- Clk0 precharge
- Output charges
- Clk1 evaluation
- Output conditionally discharges
62Salient features
- Non Ratioedonly one path is on at a time
- Inverting Logic
- Less Transistors
- No glitches (Only 1?0 Transition)
- Low Input Cap.
63Power issues
- Power dissipated by clk circuit is huge
- Power dissipated by gate is less
lt
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65Problems
- Charge sharing, degraded logic levels
- Charge leakage
- Tphl moreextra evaluation transistor in chain
66Charge Sharing, Leakage
67Remedy For Charge Sharing, Leakage
68Voh Degradation
- ½ Vdd
If CL
69Cascading problem in dynamic--leads to
malfunctioning circuit
70Problem-
- Output tri-stated in evaluation phase
- B1, A 1?0,
- A cannot change instantaneously
- So Vout starts discharging
- Voh gets degraded
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72Precharge/ evaluation
- Clk0 precharge
- Output charges
- Clk1 evaluation
- Output conditionally discharges
73Example
Expected output
74Remedy 1domino CMOS
75DUAL RAIL DOMINO/ CLKED DCVSL
76Example--- A.B C.DE
77ADVANTAGE1 --MULTIPLE OUTPUT DOMINO
78Example
Multiple precharge trans.
79ADVANTAGE2COMPOUND DOMINO
80REMEDY ---NP CMOS logic
81Single cycle operation
82Example--- A.B C.DE
834-bit Adder design
84NP CMOS-pipeline implementation Multiple cycle
operation
CLK
CLK
85Pipelined implementation-requires latch in
between to store data
To save output
To latch input
86TSPC modified NP DOMINO WITH STORAGE ELEMENTS
87TSPC
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90Appendix
91Driving Large Capacitances
92Using Cascaded Buffers
93design
- Determine N, u
- cLun1 cg
- (n1)ln (cL/cg) / ln(u)
- Delayto (cdu cg) / (cdcg)
- Delay total (n1) to (cdu cg) / (cdcg)
- Delay total ln (cL/cg) / ln(u)
- to (cdu
cg) / (cdcg) - u(ln u-1) (cd/cg) 0
- U e
94tp as function of u and x
95Impact of Cascading Buffers
96Output Driver Design