Failure Analysis Techniques

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The 1st Analytical Techniques Conference
21st November 2008 Teaching Block 1A, LT1A(A),
Singapore Polytechnic
Organized by
In association with
Sponsor
Innovative metrology and characterization are
critical for development of nanotechnology and
clean technology. New materials, novel processing
and assembly, and innovative devices present
formidable metrology and diagnostic challenges.
Advanced characterisation is essential in
improving nano-scale process technology, solar
cell manufacturing and other products based on
advanced materials. Analytical tools and
specialised sample preparation methodologies are
the building blocks and provide opportunities for
leading-edge local and regional manufacturers to
link composition, structure, morphology,
roughness, adhesion and hardness with defect
reduction, yield improvement and optimum
performance enhancement. A one-day conference
on the latest analytical techniques, highlighting
their relevance to semiconductor device
manufacturing and solar cell manufacturing, will
be held on 21st November 2008 at Singapore
Polytechnic.
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The 1st Analytical Techniques Workshop

• 0845 Registration
• 0900 Welcome Address
• 0910 Signing of MOU between AMTC and SSFS
• 0920 Introduction Speech Advanced Analytical
  Technology and its Relevance to Regional
  Electronic Eco-system
• Speaker Dr Gopal Krishnan, Scientist / Manager,
  Institute of Microelectronics, ASTAR
• 0940 Coffee / Tea Break
• 1000 Title Contamination-Free Environment and
  Recommended Practices for Manufacturing Precision
  Products
• Speaker Dr Victor Chia, Director, Balazs
  Analytical Services, USA
• 1100 Title Surface and Near Surface Analysis for
  Microelectronics and Related Industries
• Speaker Dr A. D. Trigg, Senior Scientist,
  Institute of Microelectronics, ASTAR, Singapore
• 1200 Lunch Business Networking
• 1330 Title Advanced Analytical Techniques for
  Micro-contamination Analysis
• Speaker Lei Zhi Pei, Manager (Micro-contaminatio
  n Dept.), Setsco Services Pte Ltd
• 1430 Title Characterization and Analysis of
  Solar Cell
• Speaker Dr Ke Lin, The Materials Analysis and
  Characterization Group, Institute of Materials
  Research and Engineering, ASTAR
• Coffee / Tea Break
• 1550 Title Surface Metrology
• Speaker
• 1620 End of Event

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• Talk 1 Contamination-Free Environment and
  Recommended Practices for
• Manufacturing Precision Products
• Abstract
• A contamination-free environment is necessary to
  achieve a high yield process flow for
  manufacturing precision
• products in the semiconductor and high technology
  industries. Critical environments are the
  production floor,
• mini-environment hoods, process tools and wafer
  carriers. Achieving contamination-free
  manufacturing
• therefore relies on many integrated practices to
  ensure these environments are indeed
  contamination-free
• initially and during operation. This presentation
  provides a comprehensive overview that will
  include practices
• and test methods for
• Improving the airborne quality, or in other words
  reducing the airborne molecular contamination
  (AMC), of the manufacturing floor by using
  appropriate building materials and adopting
  recommended practices in the cleanroom.
• Implementing cleanroom baselining and continuous
  monitoring programs and establishing cleanroom
  inorganic and organic contamination
  specifications.
• Controlling process tool cleanliness by applying
  strict quality control of the supplier chain for
  starting materials, machine shops, cleaning
  vendors and contract manufacturing - this is only
  possible by instigating cleanliness
  specifications for the build of materials (BOM).
• Ensuring wafer carriers are not contributing
  contamination during wafer transport or wafer
  storage.
• About the Speaker Dr Victor Chia
• Victor Chia is a Director of Air Liquide-Balazs
  NanoAnalysis. His responsibilities include
  advancing surface
• contamination technologies at Balazs, global
  sales and international business development.
  Victor has served in
• the semiconductor industry for over 20 years. He
  received his Ph.D. in Analytical Chemistry from
  the University
• of California, Santa Barbara and was a
  post-doctoral fellow at Lawrence Berkeley
  Laboratory. Victor has hands

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• Talk 3 Advanced Analytical Techniques for
  Micro-contamination Analysis
• Abstract
• Contamination of electronic components, clean
  room consumables, equipment or incoming materials
• can a devasting impact on yield in manufacture of
  semiconductor devices, displays or hard disk
  drives.
• Source of contamination include surfactants
  residues, solvents, plasticizers, mold release
  agents,
• lubricants, human debris etc Lei Zhi Pei,
  manager of the Chemical and Micro-contamination
• Department at Setsco, who has more than 15 years
  chemical contamination analysis, will explain how
• chemical analysis techniques can provide
  quantitative analysis of Micro-contamination. Hot
  topics
• today are the analysis of banned hazardous
  substances (eg RoHS) in electronic components and
• analysis of airborne molecular contamination
  (AMC) in cleanroom air.
• Topics Covered
• What is Micro-contamination?
• Where dose Micro-contamination Analysis need?
• Techniques for Micro-contamination Analysis
• Airborne Molecular Contamination (AMC)
• Ultra-pure water and Ultra-pure Chemicals
• RoHS Compliance
• About the Speaker Lei Zhi Pei

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• Talk 5 Surface Metrology
• Abstract
• The routine study of atomic and molecular scale
  structure has become possible with the
  development of
• the scanning tunneling microscope (STM) and the
  atomic force microscope (AFM). But as technology
• moves towards miniaturization down to the atomic
  level, accurate nano-scale measurements become
• increasingly important.
• Surface metrology is concerned with the nature of
  the surface and its use as well as the practical
  aspects
• of measurement. Atomic-scale measurements pose
  new challenges to industry in terms of
  measurement
• traceability and proper calibration. The talk
  discusses these challenges and highlights some of
  the ways to
• overcome them. The recent progress in
  nanometrology for surface measurements at the
  National
• Metrology Centre will be introduced to the
  audience as well.
• About the Speaker Tan Siew Leng
• Ms Tan Siew Leng is currently the Head of Optical
  Metrology Department in National Metrology
  Centre,
• ASTAR (Agency for Science, Technology and
  Research). She manages and oversees the metrology
• activities in the fields of length, dimensional,
  photometry, radiometry, time and frequency.
• Ms Tan holds an Honours degree in Physics and a
  Master in the Management of Technology, both from
• the National University of Singapore. She has
  over 20 years of experience in length and
  dimensional

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The 1st Analytical Techniques Conference

• Registration
• Please register with Ms Kristine ML Lee,
  Singapore Polytechnic.
• Email krslee_at_sp.edu.sg
• Telephone [phone]
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