Title: CMOS Logic
1Chapter 2
Application-Specific Integrated CircuitsMichael
John Sebastian Smith Addison Wesley, 1997
2The MOS Transistor
Figures from material provided with Digital
Integrated Circuits, A Design Perspective, by Jan
Rabaey, Prentice Hall, 1996
3The MOS Transistor
Figure 2.3 An N-channel MOS transistor
4Threshold Voltage Concept
Figures from material provided with Digital
Integrated Circuits, A Design Perspective, by Jan
Rabaey, Prentice Hall, 1996
5The Threshold Voltage
Figures from material provided with Digital
Integrated Circuits, A Design Perspective, by Jan
Rabaey, Prentice Hall, 1996
6Current-Voltage Relations
Figures from material provided with Digital
Integrated Circuits, A Design Perspective, by Jan
Rabaey, Prentice Hall, 1996
7Current-Voltage Relations
Figures from material provided with Digital
Integrated Circuits, A Design Perspective, by Jan
Rabaey, Prentice Hall, 1996
8Transistor in Saturation
Figures from material provided with Digital
Integrated Circuits, A Design Perspective, by Jan
Rabaey, Prentice Hall, 1996
9I-V Relation
Figures from material provided with Digital
Integrated Circuits, A Design Perspective, by Jan
Rabaey, Prentice Hall, 1996
10Velocity Saturation
(a)
(b)
(c)
Figure 2.4 MOS N-channel transistor
characteristics for a generic 0.5 mm process. (a)
IV curves for several short channel devices. (b)
IV characteristics represented as a surface. (c)
Linear IV characteristic due to velocity
saturation
11MOS Logic Levels
Figure 2.5 CMOS logic levels. (a) A strong 0.
(b) A weak 1. (c) A weak 0. (d) A strong 1.
12MOS Transistors as Switches
Figure 2.1 CMOS transistors as switches. (a) An
N-channel transistor. (b) A P-channel transistor.
(c) A CMOS inverter
13CMOS Logic
Figure 2.2 CMOS logic. (a) A two-input NAND gate.
(b) A two-input NOR gate.
14MOS IC Fabrication
Figure 2.6 IC fabrication Grow crystalline
silicon (1) make wafer (2-3) grow and oxide
layer (4) apply liquid photoresist (5) mask
exposure (6) cross-section showing exposed
photoresist (7) etch the oxide layer (8) ion
implantation (9-10) strip resist (11) strip
oxide (12) repeat steps similar to 4-12 for
subsequent layers (12-20 times for a typical CMOS
process).
15CMOS Device Layers
Figure 2.7 The drawn layers, final layout, and
phantom cell view of the standard cell shown in
figure 1.3
16Drawn vs. Actual Transistor Layers
Figure 2.9 The transistor layers (a) a drawn
P-channel layout. (b) The corresponding silicon
cross-section.
17Drawn vs. Actual Interconnect Layers
Figure 2.10 The interconnect layers. (a) The
drawn layers. (b) The corresponding structure.
18Typical CMOS Layout Rules
Figure 2.11 The MOSIS SCMOS design rules (rev.
7). Dimensions are in l.
19Typical CMOS Library Cells
Figure 2.12 Naming and numbering conventions for
complex CMOS cells. (a) An AND_OR_INVERT cell.
(b) An OR-AND-INVERT cell
20Constructing a CMOS Logic Cell
Figure 2.13 Constructing a CMOS AOI221 cell. (a)
Use Demorgans theorem to push inversion
bubbles to the inputs. (b) Build the pull-up and
pull-down networks from PMOS and NMOS
transistors. (c) Adjust transistor sizes so that
the n and p based networks have the same drive
strength - to ensure equal rise and fall times.
21CMOS Transmission Gates
Figure 2.14 CMOS transmission gate (TG). (a) a P
and N transistor implementation. (b) A common
symbol. (c) The charge sharing problem.
22CMOS Implementation of a Multiplexer
Figure 2.15 A CMOS multiplexer (MUX). (a) A TG
implementation without buffering. (b) The
corresponding logic symbol. (c) The IEEE standard
symbol. (d) an alternate (non-standard) IEEE
symbol. (e) An inverting, buffered implementation
and its logic symbol. (f) a non-inverting,
buffered implementation and its symbol.
23Implementing an Mutiplexer Using an OAI22 Cell
Figure 2.16 An inverting 21 mux based on an
OAI22 cell
24CMOS Latch
Figure 2.17 CMOS latch. (a) A positive-enable
latch using transmission gates (b) Operation when
enable is high. (b) Operation when enable is low.
25CMOS Flip-Flop
Figure 2.18 CMOS flip-flop. (a) Negative edge
triggered master-slave. (b) Master loads when
clock is high. (c) Slave loads output value of
master latch when clock goes low. (d) Waveforms
illustrating setup, hold, and propagation times.
26Datapath Logic Cells
Figure 2.20 A datapath adder. (a) A full adder
(FA) cell. (b) A 4-bit adder. (c) Wiring layout
using 2 level metal. (d) The datapath layout
27Datapath Elements
Figure 2.21 Symbols for a datapath adder. (a) A
generic symbol. (b) An alternate symbol. (c) A
symbol with control lines.
28Ripple Carry Adder
Figure 2.22 The ripple carry adder (RCA). (a) A
conventional RCA. (b) An implementation using
alternate cells for even and odd bits.
29Carry-Save Adder
Figure 2.23 The carry-save adder (CSA). (a) A CSA
cell. (b) A 4-bit CSA. (c) Symbol for a CSA. (d)
A 4-input CSA. (e) The datapath for a 4-bit adder
using CSAs. (f) A pipelined adder. (g) The
datapath for the pipelined version.
30Lookahead Carry Adder
Figure 2.24 The Brent-Kung carry-lookahead adder.
(a) Carry generation. (b) Cell to generate
look-ahead terms. (c) Arrangement of cells. (d)
and (e) Simplified representations of parts a and
c. (f) The lookahead logic for an 8 bit adder.
(g) An 8 bit Brent-Kung CLA.
31Carry Select Adder
Figure 2.25 The conditional-sum adder (a) A 1-bit
conditional adder. (b) The multiplexer to select
sums and carries. (c) A 4-bit conditional-sum
adder
32Comparison of Adder Implementations
Figure 2.26 Delay and area comparison for
datapath adders. (a) Delay normalized to a
two-input NAND logic cell delay. (b) Adder area.
33Array Multiplier
Figure 2.27 A 6-bit array multiplier using a
final carry-propagate adder.
34Other Datapath Elements
Figure 2.32 Symbols for datapath elements. (a) An
N-bit wide register. (b) An N-bit wide two-input
NAND array. (c) An N-bit wide two-input NAND
array with a control input. (d) An N-bit wide
MUX. (e) An N-bit wide incrementer/decrementer.
(f) An N-bit wide all zeros detector. (g) An
N-bit wide all ones detector. (h) An N-bit wide
adder/subtracter.
35I/O Cells
- I/O pads are specalized to connect to the actual
pins of the device - Electrostatic discharge (ESD)
- High(er) drive capability to drive larger
capacitances (bonding pad, bond wire, device pin,
PCB trace gt 20pF) - Different types of I/O pads are provided to
perform different functions - Digital input
- Digital Output
- Digital Bi-directional
- Analog In/Output
Figure 2.33 A tri-state bidirectional output
buffer with I/O pad.