Linsen und Atomlithographie

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Linsen und Atomlithographie
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J. E. Bjorkholm, R. R. Freeman, A. Ashkin, and D.
B. Pearson Phys. Rev. Lett. 41, 1361 (1978)
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Magnetische Linsen
H. Friedeburg und W. Paul, Naturwiss 38, 159
(1951) w.g. Kaenders, F. Lison, A. Richter, R.
Wynands, D. Meschede Nature 375, 214 (1995)
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Fokussierung durch Hohlspiegel
h R/4
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Fokussierung durch Hohlspiegel
Atome
Ca. 1 Mio. Rb Atome T 10 mK h 13.5
mm Fallzeit 50 ms Atomspiegel
Videoband Hohlspiegel Zur Fokussierung
13.5 mm
magnetisches Videoband
SCOAP
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Fresnel Zonen Platte
O. Carnal, M. Sigel, T. Sleator, H. Takuma, and
J. MlynekPhys. Rev. Lett. 67, 3231-3234 (1991)  
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Atom lithography
T. Sleator et al Appl. Phys B. 54 375 (1992) G.
Timp et al. PRL 69 1636 (1992) J.J. McClelland et
al. Science 262,887 (1993)
Cr on Silicon
AFM-picture
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Atom lithography
T. Sleator et al Appl. Phys B. 54 375 (1992) G.
Timp et al. PRL 69 1636 (1992) J.J. McClelland et
al. Science 262,887 (1993)
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2D structures hexagonal
red detuning
blue detuning
a2/3l284 nm
long range order
7.5x7.5 mm2
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various structures
Intensity gradients l/2 limit
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Polarization gradients
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period 61 nm

-
-

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Polarization gradients in 2D
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Various Nano Structures
detuning
geometry
61 nm
polarization
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Atom lithography new features
neutral beam atom light interaction
laser cooling beam preparation
low energy direct deposition ldB1..100pm
phasemasks with sub 100 nm structures selective
manipulation

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Unconventional application
dopand
matrix
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light mask is selective structured doping 3D
lithography
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Unconventional application
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3D lithography possible application photonic
crystals
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SEM AES Analysis
In coll. with Dr. E. Nold FZ Karlsruhe Th.
Schulze et al. APL, 78, 1781 (2001)
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New optical materials?