Nanolithography And Nanofabrication

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Nanolithography And Nanofabrication ELEC
7950 Special Topics on Nanoscale Science and
Technology Summer 2003 Y. Tzeng Professor,
ECE Auburn University
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http//personal.cityu.edu.hk/appkchu/AP4120/5v.pd
f
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Intels lithography Roadmap
www.intel.com/technology/itj/2002/volume06issue02/
art06_lithographyroadmap/p03_roadmap.htm
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Sub-wavelength lithography
www.intel.com/technology/itj/2002/volume06issue02/
art06_lithographyroadmap/p03_roadmap.htm
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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TeraHertz transistor with 15nm gate
Transistor physics and material properties will
not prevent continuing on the path of Moores Law
for some years to come. The key issue will be
the availability of lithography equipment that
can pattern sub-50nm features, in high-volume
applications, at affordable costs.
www.intel.com/technology/itj/2002/volume06issue02/
art06_lithographyroadmap/p03_roadmap.htm
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http//personal.cityu.edu.hk/appkchu/AP4120/5v.pd
f
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http//personal.cityu.edu.hk/appkchu/AP4120/5v.pd
f
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http//users.ece.gatech.edu/alan/11-6-Mohanty-Ext
reme20UV20Litho.pdf
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http//users.ece.gatech.edu/alan/11-6-Mohanty-Ext
reme20UV20Litho.pdf
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http//personal.cityu.edu.hk/appkchu/AP4120/5v.pd
f
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//users.ece.gatech.edu/alan/11-6-Mohanty-Ext
reme20UV20Litho.pdf
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http//users.ece.gatech.edu/alan/11-6-Mohanty-Ext
reme20UV20Litho.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//users.ece.gatech.edu/alan/11-6-Mohanty-Ext
reme20UV20Litho.pdf
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• Intel adopts the following strategy
• Rapid transition to each new generation of
  lithography equipment, i.e. shorter wavelengths.
• Using fast (high-run-rate) lithography tools.
• Reusing lithography equipment over multiple
  process generations.
• Intel expects that this strategy will allow
  lithography to continue to be affordable into the
  45nm technology generation and beyond.

www.intel.com/technology/itj/2002/volume06issue02/
art06_lithographyroadmap/p03_roadmap.htm
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X-Ray Lithography
http//personal.cityu.edu.hk/appkchu/AP4120/5v.pd
f
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Electron Beam Lithography
http//personal.cityu.edu.hk/appkchu/AP4120/5v.pd
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Focused Ion Beam Lithography
http//personal.cityu.edu.hk/appkchu/AP4120/5v.pd
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Atom Optics
G. Timp, R.E. Behringer, D.M. Tennant, J.E.
Cunningham, M. Prentiss and K.K. Berggren, Using
Light as a Lens for Submicron, Neutral-Atom
Lithography, Physical Review Letters 69(11), 14
September 1992.
http//www.iap.uni-bonn.de/ag_meschede/atomoptik/n
ist.pdf
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AFM images
http//www.iap.uni-bonn.de/ag_meschede/atomoptik/n
ist.pdf
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http//www.iap.uni-bonn.de/ag_meschede/atomoptik/n
ist.pdf
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http//physics.ust.hk/phkywong/presentations/bec.
ppt
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http//physics.ust.hk/phkywong/presentations/bec.
ppt
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http//physics.ust.hk/phkywong/presentations/bec.p
pt
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www.stanford.edu/group/quate_group/LithoFra
me.html
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http//www.stanford.edu/group/quate_group/LithoFra
me.html
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http//www.stanford.edu/group/quate_group/LithoFra
me.html
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http//www.stanford.edu/group/quate_group/LithoFra
me.html
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http//www.stanford.edu/group/quate_group/LithoFra
me.html
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http//www.stanford.edu/group/quate_group/LithoFra
me.html
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http//www.stanford.edu/group/quate_group/LithoFra
me.html
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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http//www-inst.eecs.berkeley.edu/ee143/f2002/Lec
tures/Lec_28.pdf
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Atom optics Laser manipulated atoms http//www.ia
p.uni-bonn.de/ag_meschede/atomoptik/nist.pdf   Ato
m lithography, atom laser, atom optics,
Bose-Einstein Condensate http//physics.ust.hk/phk
ywong/presentations/bec.ppt   Intels EUV
lithography, a GIT lecture http//users.ece.gatech
.edu/alan/11-6-Mohanty-Extreme20UV20Litho.pdf  
Fabrication Techniques for nanostructures-a
Berkeley lecture http//www-inst.eecs.berkeley.edu
/ee143/f2002/Lectures/Lec_28.pdf   Different
phase-shift masks http//www.npeurope.com/docs/pha
se_shift.pdf   Lithography-Chu http//personal.cit
yu.edu.hk/appkchu/AP4120/5v.pdf